⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL223593 | 0.75 | — | — | |
| SCHEMBL11760105 | 0.75 | — | — | |
| SCHEMBL190566 | 0.73 | CYP2D6 (0.37) | — | |
| SCHEMBL13525855 | 0.71 | — | — | |
| SCHEMBL14336309 | 0.71 | — | — | |
| SCHEMBL9063860 | 0.71 | — | — | |
| SCHEMBL18560054 | 0.71 | — | — | |
| SCHEMBL8961487 | 0.71 | — | — | |
| SCHEMBL12215347 | 0.71 | CYP2D6 (0.40) | — | |
| SCHEMBL8836123 | 0.71 | CYP2D6 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 308 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12552888-B2 | Curable resin composition and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-02-17 | — | — | US | disclosed |
| US-12528983-B2 | Curable resin composition and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2026-01-20 | — | — | US | disclosed |
| US-12504564-B2 | Layered body and display device | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-12-23 | — | — | US | disclosed |
| US-20250313523-A1 | FRAGRANCE AND FLAVOR COMPOSITIONS COMPRISING NORBORNANE AND NORBORNENE DERIVATIVES | OSMO LABS, PBC | 2025-10-09 | — | — | US | disclosed |
| US-20250228063-A1 | COMPOSITION, FILM, AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-07-10 | — | — | US | disclosed |
| US-20250215315-A1 | COMPOSITION, FILM, AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250207026-A1 | COMPOSITION, FILM, AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-120195932-A | Colored resin composition, color filter and display device | 住友化学株式会社 | 2025-06-24 | — | — | CN | disclosed |
| CN-113485071-B | Colored resin composition, photoresist structure, color filter and display device using the same | 住华科技股份有限公司 | 2025-06-24 | — | — | CN | disclosed |
| CN-120195931-A | Colored resin composition, color filter and display device | 住友化学株式会社 | 2025-06-24 | — | — | CN | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1191061-A1 | Flame-retardant rubber composition and flame-retardant elastomer | JSR Corporation (JP) | 2002-03-27 | — | — | EP | disclosed |
| US-20010044075-A1 | Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element | JSR CORPORATION (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1150165-A1 | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element | JSR Corporation (JP) | 2001-10-31 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-6280897-B1 | GENERATION OF ACID WITH ACTINIC RADIATION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1113027-A1 | Olefin copolymer having functional group, production process thereof and rubber composition | JSR Corporation (JP) | 2001-07-04 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| EP-1057859-A2 | Radiation sensitive resin composition and use of the same in an interlaminar insulating film | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |