Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL16401493 | 1.00 | — | — | |
| Propene SCHEMBL9308404 | 1.00 | — | — | |
| Propene SCHEMBL27863395 | 1.00 | TSHR (0.40) | TSHRALDH1A1 | |
| Propene SCHEMBL241947 | 1.00 | — | — | |
| Propene SCHEMBL10795836 | 0.95 | — | — | |
| Propene SCHEMBL11617911 | 0.95 | TSHR (0.38) | TSHRALDH1A1 | |
| Propene SCHEMBL7560605 | 0.95 | — | — | |
| Butane SCHEMBL10482614 | 0.91 | TSHR (0.44) | TSHRALDH1A1 | |
| Propene SCHEMBL28921134 | 0.91 | TSHR (0.35) | TSHRALDH1A1 | |
| Butane SCHEMBL8863768 | 0.87 | TSHR (0.41) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110086314-A1 | MELTS | ROHM AND HAAS ELECTRONIC MATERIAL LLC (US) | 2011-04-14 | — | — | US | disclosed |
| US-20090214980-A1 | Melts | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-08-27 | — | — | US | disclosed |
| US-20060121389-A1 | Melts | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-06-08 | — | — | US | disclosed |
| EP-1630600-A2 | Hot melt composition and method involving forming a masking pattern | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-03-01 | — | — | EP | disclosed |
| EP-0330339-B1 | Method of forming conformable masks | MORTON INT INC (US) | 1998-04-29 | — | — | EP | disclosed |
| EP-0330339-A2 | Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like | MORTON INTERNATIONAL, INC. (US) | 1989-08-30 | — | — | EP | disclosed |