SCHEMBL1616749

SCHEMBL1616749

CC=CC(O)=CCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6473891 0.81
SCHEMBL466207 0.78
SCHEMBL19808543 0.78
SCHEMBL12519411 0.73
SCHEMBL4358555 0.73 EP300 (0.52)
SCHEMBL4359633 0.73 EP300 (0.52)
SCHEMBL4361559 0.73 EP300 (0.52)
SCHEMBL13462891 0.72
SCHEMBL7630024 0.72
SCHEMBL14724947 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070020529-A1 organic electrolytic solution that suppresses a side reaction on the surface of an anode to thereby maintain reliability of charge/discharge reactions; includes surfactant having hydrophilic and hydrophobic ends, for example polyethyelne glycol with tertoctylphenyl and perfluorobenzyl endcaps SAMSUNG SDI CO., LTD. (KR) 2007-01-25 US claimed
CN-117795011-A A composition 瓦克化学股份公司 2024-03-29 CN disclosed
CN-115803354-A Crosslinkable substances based on silane-terminated polymers 瓦克化学股份公司 2023-03-14 CN disclosed
EP-3830161-A1 COMPOSITION CONTAINING POLYURETHANE FOR PRODUCING RESIN Bostik SA (FR) 2021-06-09 EP disclosed
WO-2020021203-A1 COMPOSITION CONTAINING POLYURETHANE FOR PRODUCING RESIN BOSTIK SA (FR) 2020-01-30 WO disclosed
US-8034491-B2 Organic electrolytic solution and lithium battery employing the same SAMSUNG SDI CO., LTD. (KR) 2011-10-11 US disclosed
US-7923580-B2 Polymerizable boric compounds, methods of producing the same, polymerizable compositions and ionic-conductive polymeric electrolytes HITACHI, LTD. (JP) 2011-04-12 US disclosed
US-7759003-B2 Polymerizable boric compounds, methods of producing the same, polymerizable compositions and ionic-conductive polymeric electrolytes HITACHI, LTD. (JP) 2010-07-20 US disclosed
US-20100179350-A1 Polymerizable boric compounds, methods of producing the same, polymerizable compositions and ionic-conductive polymeric electrolytes IWAYASU NORIO 2010-07-15 US disclosed
US-20070020529-A1 organic electrolytic solution that suppresses a side reaction on the surface of an anode to thereby maintain reliability of charge/discharge reactions; includes surfactant having hydrophilic and hydrophobic ends, for example polyethyelne glycol with tertoctylphenyl and perfluorobenzyl endcaps SAMSUNG SDI CO., LTD. (KR) 2007-01-25 US disclosed
EP-0904254-B1 GLASSWARE WITH ABRASION RESISTANT, TRANSPARENT PROTECTIVE COATING CAPABLE OF BEING LABELLED AND METHOD FOR PRODUCING SAME ELF ATOCHEM VLISSINGEN BV (NL) 2000-03-29 EP disclosed
US-6034088-A USING MIXTURE OF PENTOXIFYLLINE, WATER AND POLYOXYALKYLENE BLOCK COPOLYMER MDV TECHNOLOGIES, INC. (US) 2000-03-07 US disclosed
EP-0904254-A1 GLASSWARE WITH ABRASION RESISTANT, TRANSPARENT PROTECTIVE COATING CAPABLE OF BEING LABELLED AND METHOD FOR PRODUCING SAME Elf Atochem Vlissingen B.V. (NL) 1999-03-31 EP disclosed
US-5843470-A Method and composition for inhibiting post-surgical adhesions MDV TECHNOLOGIES, INC. (US) 1998-12-01 US disclosed
WO-1998029147-A1 METHOD AND COMPOSITION FOR INHIBITING POST-SURGICAL ADHESIONS MDV TECHNOLOGIES, INC. (US) 1998-07-09 WO disclosed
WO-1997047563-A1 GLASSWARE WITH ABRASION RESISTANT, TRANSPARENT PROTECTIVE COATING CAPABLE OF BEING LABELLED AND METHOD FOR PRODUCING SAME ELF ATOCHEM VLISSINGEN B.V. (NL) 1997-12-18 WO disclosed
US-5366735-A Method and composition for post-surgical adhesion reduction MEDIVENTURES, INC. (US) 1994-11-22 US disclosed
EP-0542218-A1 Conformal coating compositions UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-05-19 EP disclosed
US-4191537-A ANTIDEPOSIT AGENTS CHEVRON RESEARCH COMPANY (US) 1980-03-04 US disclosed
US-3954845-A Synthetic detergents of the ampholytic betaine type, process for preparing the same and compositions MODOKEMI AKTIEBOLAG (SW) 1976-05-04 US disclosed