⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1618636 | 0.84 | — | — | |
| SCHEMBL28255671 | 0.82 | BCHE (0.38) | — | |
| Water SCHEMBL30172505 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL28726275 | 0.80 | BCHE (0.38) | — | |
| Acetic Acid SCHEMBL27777035 | 0.80 | — | — | |
| Sulfuric Acid SCHEMBL30976068 | 0.75 | — | — | |
| SCHEMBL27882378 | 0.74 | — | — | |
| SCHEMBL486704 | 0.73 | — | — | |
| Sulfuric Acid SCHEMBL28901691 | 0.72 | — | — | |
| SCHEMBL28222176 | 0.72 | FFAR3 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7923142-B2 | Onium salt, electrolyte for nonaqueous cell containing the novel onium salt for nonaqueous cell and method for optimizing negative electrode using electrolyte containing onium salt | TOKUYAMA CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-7846576-B2 | Onium salt, electrolyte for non-aqueous cell containing the novel onium salt for nonaqueous cell, and method for optimizing negative electrode using elecrolyte containing onium salt | TOKUYAMA CORPORATION (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20080039634-A1 | NOVEL ONIUM SALT, ELECTROLYTE FOR NONAQUEOUS CELL CONTAINING THE NOVEL ONIUM SALT FOR NONAQUEOUS CELL AND METHOD FOR OPTIMIZING NEGATIVE ELECTRODE USING ELECTROLYTE CONTAINING ONIUM SALT | TOKUYAMA CORPORATION | 2008-02-14 | — | — | US | disclosed |