⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28840907 | 0.97 | — | — | |
| SCHEMBL28765427 | 0.82 | — | — | |
| SCHEMBL31332333 | 0.81 | HCAR2 (0.52) | — | |
| SCHEMBL26841662 | 0.81 | TSHR (0.50) | — | |
| SCHEMBL25921 | 0.81 | — | — | |
| SCHEMBL2727797 | 0.81 | TSHR (0.50) | — | |
| SCHEMBL27402151 | 0.80 | TSHR (0.45) | — | |
| SCHEMBL10773528 | 0.79 | — | — | |
| Ammonia Solution, Strong SCHEMBL1881209 | 0.79 | — | — | |
| SCHEMBL20730 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115050922-A | Water-based binder and preparation method and application thereof | 深圳市研一新材料有限责任公司 | 2022-09-13 | — | — | CN | claimed |
| CN-115023241-A | Disinfecting composition | 日油株式会社 | 2022-09-06 | — | — | CN | claimed |
| CN-112867920-B | Method for controlling scale formation in water systems | 诺力昂化学品国际有限公司 | 2022-07-15 | — | — | CN | claimed |
| EP-3728339-B1 | COMPOSITION FOR OPHTHALMOLOGICAL PRODUCTS | AMO Ireland (IE) | 2022-07-06 | — | — | EP | claimed |
| CN-114206787-A | Method for controlling carbonate scale in water system | 诺力昂化学品国际有限公司 | 2022-03-18 | — | — | CN | claimed |
| CN-112867920-A | Method for controlling scale in water systems | 诺力昂化学品国际有限公司 | 2021-05-28 | — | — | CN | claimed |
| EP-3728339-A1 | COMPOSITION FOR OPHTHALMOLOGICAL PRODUCTS | Merck Patent GmbH (DE) | 2020-10-28 | — | — | EP | claimed |
| CN-105785720-B | Photosensitive resin composition, photocured pattern formed therefrom, and image display device having the same | 东友精细化工有限公司 | 2020-02-07 | — | — | CN | claimed |
| CN-104614940-B | A kind of photosensitive polymer combination and its application | 常州强力先端电子材料有限公司 | 2019-04-09 | — | — | CN | claimed |
| CN-103890658-A | Photosensitive resin composition for color filter and color filter made by using the same | DONGJIN SEMICOHEM CO LTD | 2014-06-25 | — | — | CN | claimed |
| CN-1795215-A | Curing resin composition, optical component and optical waveguide | OMRON TATEISI ELECTRONICS CO (JP) | 2006-06-28 | — | — | CN | claimed |
| CN-1786752-A | Photosensitive resin composition for color filter and method for mfg. LCD color filter by same | DONGJIN SEMICHEM CO LTD (KR) | 2006-06-14 | — | — | CN | claimed |
| CN-1774468-A | Porous film of vinylidene fluoride resin and method for producing same | KUREHA CORP (JP) | 2006-05-17 | — | — | CN | claimed |
| CN-1646639-A | Use of block copolymers bearing phosphate and/or phosphonate functions as adhesion promoters or as protecting agents against the corrosion of a metallic surface | RHODIA CHIMIE SA (FR) | 2005-07-27 | — | — | CN | claimed |
| WO-2005055959-A2 | BULKY MONOMERS LEADING TO RESINS EXHIBITING LOW POLYMERIZATION SHRINKAGE | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-06-23 | — | — | WO | claimed |
| US-20050124721-A1 | Bulky monomers leading to resins exhibiting low polymerization shrinkage | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-06-09 | — | — | US | claimed |
| CN-1519592-A | Photosensitive resin compsn. controlling solubility and pattern formation method of double-layer structure using same | 三星电子株式会社 | 2004-08-11 | — | — | CN | claimed |
| US-5332796-A | Organopolysiloxanes and methods for making | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1994-07-26 | — | — | US | claimed |
| EP-0174373-B1 | PROCESS FOR PRODUCING HEAT-RESISTANT RESIN MOLDINGS HAVING EXCELLENT ABRASION RESISTANCE | MITSUBISHI RAYON CO., LTD. (JP) | 1989-08-02 | — | — | EP | claimed |
| EP-0174373-A1 | PROCESS FOR PRODUCING HEAT-RESISTANT RESIN MOLDINGS HAVING EXCELLENT ABRASION RESISTANCE | MITSUBISHI RAYON CO., LTD. (JP) | 1986-03-19 | — | — | EP | claimed |