⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL251689 | 1.00 | — | — | |
| SCHEMBL8517756 | 1.00 | — | — | |
| SCHEMBL3263623 | 1.00 | — | — | |
| SCHEMBL8085351 | 1.00 | — | — | |
| SCHEMBL289603 | 1.00 | — | — | |
| SCHEMBL861285 | 1.00 | — | — | |
| SCHEMBL1147856 | 1.00 | — | — | |
| Acetic Acid SCHEMBL4539714 | 0.91 | — | — | |
| Acetic Acid SCHEMBL4544291 | 0.91 | — | — | |
| Acetic Acid SCHEMBL4544140 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1505139-B2 | THICKENER, COSMETIC PREPARATION CONTAINING THE SAME, AND PROCESS FOR PRODUCING THE SAME | SHISEIDO CO LTD (JP) | 2014-06-18 | — | — | EP | disclosed |
| US-20140100327-A1 | (METH)ACRYLIC ACID-BASED COPOLYMER | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2014-04-10 | — | — | US | disclosed |
| EP-1505139-B1 | THICKENER, COSMETIC PREPARATION CONTAINING THE SAME, AND PROCESS FOR PRODUCING THE SAME | SHISEIDO CO LTD (JP) | 2011-07-13 | — | — | EP | disclosed |
| US-20110098231-A1 | Skin Cosmetic | SHISEIDO COMPANY, LTD. (JP) | 2011-04-28 | — | — | US | disclosed |
| US-7927615-B2 | Thickener, cosmetic preparation containing the same, and process for producing the same | SHISEIDO COMPANY, LTD. (JP) | 2011-04-19 | — | — | US | disclosed |
| EP-2168568-A1 | SKIN COSMETIC | Shiseido Company, Limited (JP) | 2010-03-31 | — | — | EP | disclosed |
| US-20100029787-A1 | Thickener, Cosmetic Preparation Containing The Same, And Process For Producing The Same | SHISEIDO COMPANY, LTD. (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20090258964-A1 | Skin Cosmetic | SHISEIDO COMPANY, LTD. (JP) | 2009-10-15 | — | — | US | disclosed |
| US-20050175564-A1 | Tickener, cosmetic preparation containing the same, and process for producing the same | SHISEIDO COMPANY, LTD. (JP) | 2005-08-11 | — | — | US | disclosed |
| EP-1505139-A1 | THICKENER, COSMETIC PREPARATION CONTAINING THE SAME, AND PROCESS FOR PRODUCING THE SAME | SHISEIDO COMPANY, LTD. (JP) | 2005-02-09 | — | — | EP | disclosed |
| EP-0308543-B1 | COMPOSITIONS FOR EXTERNAL APPLICATION | Sansho Seiyaku Co., Ltd. (JP) | 1993-09-22 | — | — | EP | disclosed |
| US-4948577-A | KOJIC ACID AND 4-/1,1-DIMETHYLETHYL/-4'-METHOXY DIBENZOYLMETHANE; PREVENT COLORING OF SKIN WHEN EXPOSED TO ULTRAVIOLET LIGHT | SANSHO SEIYAKU CO., LTD. (JP) | 1990-08-14 | — | — | US | disclosed |
| EP-0308543-A1 | Compositions for external application | Sansho Seiyaku Co., Ltd. (JP) | 1989-03-29 | — | — | EP | disclosed |