Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | PGK1 | P00558 | 1/20 | 0.44 |
| ▸ | PGK2 | P07205 | 1/20 | 0.44 |
| ▸ | PGD | P52209 | 3/20 | 0.41 |
| ▸ | MPI | P34949 | 1/20 | 0.41 |
| ▸ | LPAR5 | Q9H1C0 | 2/20 | 0.38 |
| ▸ | LPAR1 | Q92633 | 3/20 | 0.37 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.37 |
| ▸ | LPAR6 | P43657 | 1/20 | 0.35 |
| ▸ | LPAR4 | Q99677 | 1/20 | 0.35 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.35 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1447095 | 1.00 | TDP1 (0.46) | TDP1PGK1PGK2PGDMPI | |
| SCHEMBL120836 | 0.98 | TDP1 (0.47) | TDP1PGK1PGK2PGDMPI | |
| SCHEMBL8381650 | 0.83 | TDP1 (0.48) | TDP1 | |
| SCHEMBL7091562 | 0.83 | TDP1 (0.42) | TDP1LPAR1LPAR3 | |
| SCHEMBL28767134 | 0.83 | TDP1 (0.42) | TDP1PGK1PGK2PGDMPI | |
| SCHEMBL3340733 | 0.83 | — | — | |
| SCHEMBL3344507 | 0.83 | — | — | |
| SCHEMBL1079057 | 0.83 | — | — | |
| SCHEMBL5179369 | 0.80 | TDP1 (0.40) | TDP1LPAR1LPAR3 | |
| Phosphoric Acid SCHEMBL1628018 | 0.80 | TDP1 (0.46) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7927781-B2 | Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2011-04-19 | — | — | US | claimed |
| US-20090136872-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-05-28 | — | — | US | claimed |
| US-20060141392-A1 | Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-06-29 | — | — | US | claimed |
| US-7927781-B2 | Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2011-04-19 | — | — | US | disclosed |
| US-20090136872-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING THE SAME, AND DRY FILM RESIST COMPRISING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-05-28 | — | — | US | disclosed |
| US-20060141392-A1 | Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2006-06-29 | — | — | US | disclosed |