⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL49799 | 0.82 | — | — | |
| SCHEMBL4310976 | 0.82 | — | — | |
| SCHEMBL11400690 | 0.82 | — | — | |
| SCHEMBL4310978 | 0.82 | — | — | |
| SCHEMBL1003883 | 0.82 | — | — | |
| SCHEMBL1003884 | 0.82 | — | — | |
| SCHEMBL3397325 | 0.79 | — | — | |
| SCHEMBL3799962 | 0.79 | TRPV1 (0.38) | — | |
| SCHEMBL3397326 | 0.79 | — | — | |
| SCHEMBL22444030 | 0.79 | TRPV1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2615117-B2 | WATER ABSORBENT RESIN AND METHOD FOR PRODUCING SAME | SUMITOMO SEIKA CHEMICALS (JP) | 2023-12-27 | — | — | EP | claimed |
| EP-2615117-B1 | WATER ABSORBENT RESIN AND METHOD FOR PRODUCING SAME | SUMITOMO SEIKA CHEMICALS (JP) | 2021-03-17 | — | — | EP | claimed |
| US-8198376-B2 | Process for production of water-absorbable resin | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2012-06-12 | — | — | US | claimed |
| EP-2615117-B2 | WATER ABSORBENT RESIN AND METHOD FOR PRODUCING SAME | SUMITOMO SEIKA CHEMICALS (JP) | 2023-12-27 | — | — | EP | disclosed |
| CN-111902581-B | Sandbag and manufacturing method thereof | 住友精化株式会社 | 2023-02-03 | — | — | CN | disclosed |
| CN-111902117-B | Absorbent article | 住友精化株式会社 | 2022-12-27 | — | — | CN | disclosed |
| WO-2022255220-A1 | PROCESSING SOLUTION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT | 富士フイルム株式会社 | 2022-12-08 | — | — | WO | disclosed |
| CN-115443312-A | Water-absorbent resin composition, absorbent body, and absorbent article | 住友精化株式会社 | 2022-12-06 | — | — | CN | disclosed |
| CN-115443311-A | Particulate water-absorbent resin composition, method for producing same, absorbent body, and absorbent article | 住友精化株式会社 | 2022-12-06 | — | — | CN | disclosed |
| CN-115279316-A | Water-absorbent sheet and absorbent article | 住友精化株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-110446727-B | Water-absorbent resin particles | 住友精化株式会社 | 2022-08-26 | — | — | CN | disclosed |
| US-5607534-A | PEELING HYDROPHOBIC IMAGES AWAY FROM PAPER LAYER | RICOH COMPANY, LTD. (JP) | 1997-03-04 | — | — | US | disclosed |
| EP-0732218-A1 | Ink-receiving layers for ink-jet recording elements | AGFA-GEVAERT N.V. (BE) | 1996-09-18 | — | — | EP | disclosed |
| EP-0704314-A1 | Ink jet printing system | AGFA-GEVAERT N.V. (BE) | 1996-04-03 | — | — | EP | disclosed |
| EP-0701902-A1 | Ink image-receiving element | AGFA-GEVAERT N.V. (BE) | 1996-03-20 | — | — | EP | disclosed |
| US-5418078-A | Coating of binder and polymer with phosphonium containing monomer as mordanting agent; waterfastness | AGFA-GEVAERT, N.V. (BE) | 1995-05-23 | — | — | US | disclosed |
| EP-0609930-A1 | Ink-receiving layers | AGFA-GEVAERT N.V. (BE) | 1994-08-10 | — | — | EP | disclosed |
| EP-0594896-A1 | Ink-receptive layers | AGFA-GEVAERT N.V. (BE) | 1994-05-04 | — | — | EP | disclosed |
| EP-0355752-B1 | Recording medium | CANON KK (JP) | 1994-03-09 | — | — | EP | disclosed |
| US-5059983-A | Containing acetylene oxide or glycol | CANON KABUSHIKI KAISHA (JP) | 1991-10-22 | — | — | US | disclosed |