Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17640450 | 0.82 | — | — | |
| SCHEMBL15715734 | 0.73 | TSHR (0.30) | TSHRTDP1 | |
| SCHEMBL13243456 | 0.69 | — | — | |
| SCHEMBL17068807 | 0.69 | TSHR (0.32) | TSHRTDP1 | |
| SCHEMBL57088 | 0.69 | — | — | |
| SCHEMBL14488458 | 0.67 | — | — | |
| SCHEMBL9158543 | 0.67 | — | — | |
| SCHEMBL17038702 | 0.66 | — | — | |
| Ammonia Solution, Strong SCHEMBL8081457 | 0.65 | — | — | |
| Ammonia Solution, Strong SCHEMBL11315539 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-20170115568-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9458343-B2 | Method of forming patterns | FUJIFILM CORPORATION (JP) | 2016-10-04 | — | — | US | disclosed |
| US-20160195814-A1 | PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT | FUJIFILM CORPORATION (JP) | 2016-07-07 | — | — | US | disclosed |
| US-20160048075-A1 | PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-18 | — | — | US | disclosed |
| US-20160009936-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-9176386-B2 | Method of forming patterns | FUJIFILM CORPORATION (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9122151-B2 | Resist composition, resist film therefrom and method of forming negative pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9046766-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9012123-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-04-21 | — | — | US | disclosed |
| US-7611820-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20090123880-A1 | PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20090042147-A1 | METHOD OF FORMING PATTERNS | FUJIFILM CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| US-7482112-B2 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2009-01-27 | — | — | US | disclosed |
| US-7368220-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| US-20080081290-A1 | RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20070172768-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070148589-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070059639-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |