SCHEMBL1629482

SCHEMBL1629482

C=C[Si](C)(C)O[Si](C)(C)C=C.C=C[Si](C)(C)O[Si](C)(C)C=C.C=C[Si](C)(C)O[Si](C)(C)C=C.[Pt].[Pt]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1674852 1.00
SCHEMBL28041028 1.00
SCHEMBL63112 1.00
SCHEMBL65859 0.96
Hydrochloric Acid SCHEMBL27766991 0.93
SCHEMBL28297864 0.93
SCHEMBL21630825 0.93
SCHEMBL28129974 0.93
SCHEMBL21693874 0.87
SCHEMBL8961519 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9006465-B2 Fluorene compound and process for preparing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-14 US disclosed
US-20140066636-A1 NOVEL FLUORENE COMPOUND AND PROCESS FOR PREPARING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-03-06 US disclosed
US-7932312-B2 Organosilicon compound and pressure-sensitive adhesive composition for liquid crystal element containing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-26 US disclosed
US-20100234323-A1 Antimicrobial Acids and Salts HOELZL WERNER 2010-09-16 US disclosed
US-20090137710-A1 ORGANOSILICON COMPOUND AND PRESSURE-SENSITIVE ADHESIVE COMPOSITION FOR LIQUID CRYSTAL ELEMENT CONTAINING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-28 US disclosed
EP-2024421-A1 ANTIMICROBIAL ACIDS AND SALTS Ciba Holding Inc. (CH) 2009-02-18 EP disclosed
WO-2007141239-A1 ANTIMICROBIAL ACIDS AND SALTS CIBA HOLDING INC. (CH) 2007-12-13 WO disclosed