⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL169732 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL31019655 | 0.67 | — | — | |
| SCHEMBL2825402 | 0.63 | — | — | |
| SCHEMBL18583040 | 0.63 | — | — | |
| Methyl Alcohol SCHEMBL14932133 | 0.59 | — | — | |
| SCHEMBL3307666 | 0.58 | — | — | |
| SCHEMBL105463 | 0.53 | — | — | |
| SCHEMBL11224054 | 0.50 | — | — | |
| SCHEMBL4739407 | 0.50 | — | — | |
| SCHEMBL15096838 | 0.50 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046775-B2 | Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140377707-A9 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2014-12-25 | — | — | US | disclosed |