SCHEMBL16332385

SCHEMBL16332385

CC(C)=[Zr](Cl)(Cl)(C1=CC(C(C)(C)C)=CC1C)c1c(C(C)(C)C)ccc2c1Cc1cc(C(C)(C)C)ccc1-2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL139178 0.81
SCHEMBL3270589 0.80
Hydrochloric Acid SCHEMBL2273630 0.80
Hydrochloric Acid SCHEMBL142007 0.79
Hydrochloric Acid SCHEMBL138538 0.79
Hydrochloric Acid SCHEMBL139412 0.76
SCHEMBL2803602 0.75
SCHEMBL5009400 0.74
Hydrochloric Acid SCHEMBL21638749 0.74
Hydrochloric Acid SCHEMBL139490 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9598567-B2 Propylene-ethylene copolymer resin composition and moulded article, film and sheet thereof JAPAN POLYPROPYLENE CORPORATION (JP) 2017-03-21 US disclosed
US-20160185945-A1 PROPYLENE-ETHYLENE COPOLYMER RESIN COMPOSITION AND MOULDED ARTICLE, FILM AND SHEET THEREOF JAPAN POLYPROPYLENE CORPORATION (JP) 2016-06-30 US disclosed
EP-2818510-B1 PROPYLENE-ETHYLENE COPOLYMER RESIN COMPOSITION, AND MOLDED PRODUCT, FILM AND SHEET THEREOF JAPAN POLYPROPYLENE CORP (JP) 2015-09-30 EP disclosed
EP-2818510-A1 PROPYLENE-ETHYLENE COPOLYMER RESIN COMPOSITION, AND MOLDED PRODUCT, FILM AND SHEET THEREOF Japan Polypropylene Corporation (JP) 2014-12-31 EP disclosed