SCHEMBL16404713

SCHEMBL16404713

[SiH3]c1ccc(Cl)cc1Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17552683 0.77 — —
SCHEMBL5032663 0.73 TP53 (0.88) —
SCHEMBL20707631 0.72 — —
SCHEMBL17552690 0.72 — —
SCHEMBL20707595 0.72 — —
SCHEMBL17552686 0.72 — —
SCHEMBL8873179 0.71 TP53 (1.00) —
SCHEMBL29349499 0.71 — —
SCHEMBL22730 0.71 — —
SCHEMBL5318805 0.69 TP53 (0.93) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
EP-2826826-A1 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition Shin-Etsu Chemical Co., Ltd. (JP) 2015-01-21 — — EP disclosed
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