SCHEMBL164272

SCHEMBL164272

C=COC(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL292143 0.88
SCHEMBL21625268 0.86
SCHEMBL365851 0.83
SCHEMBL2466943 0.78
SCHEMBL9718433 0.78
SCHEMBL9446541 0.77
SCHEMBL28525257 0.75
SCHEMBL28605973 0.75
SCHEMBL10016142 0.73
SCHEMBL11982595 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3449 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025260203-A1 CLICK CHEMISTRY POLYMER HYDROGELS ALLARTA LIFE SCIENCE INC. (CA) 2025-12-26 WO claimed
WO-2025260204-A1 CROSSLINKED HYDROGELS WITH CONTROLLED PERMEABILITY ALLARTA LIFE SCIENCE INC. (CA) 2025-12-26 WO claimed
CN-110515270-B Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device 信越化学工业株式会社 2024-07-12 CN claimed
EP-4379036-A1 CELL CAPTURE DEVICE, CENTRIFUGAL CONTAINER, CELL CAPTURE APPARATUS, AND CELL CAPTURE METHOD PHC Holdings Corporation (JP) 2024-06-05 EP claimed
CN-114621383-B Perfluoroether elastomer emulsion, preparation method and perfluoroether elastomer 中昊晨光化工研究院有限公司 2023-12-12 CN claimed
US-11693317-B2 Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US claimed
WO-2023008057-A1 CELL CAPTURE DEVICE, CENTRIFUGAL CONTAINER, CELL CAPTURE APPARATUS, AND CELL CAPTURE METHOD PHCホールディングス株式会社 2023-02-02 WO claimed
CN-110878147-B Multi-section bar code nanorod and preparation method thereof 嘉兴学院 2021-08-17 CN claimed
EP-3824989-A1 DRAW SOLUTE, DRAW SOLUTION, AND FORWARD-OSMOSIS WATER TREATMENT METHOD Maruzen Petrochemical Co., Ltd. (JP) 2021-05-26 EP claimed
CN-112423865-A Draw solute, draw solution and forward osmosis water treatment method 丸善石油化学株式会社 2021-02-26 CN claimed
US-5807944-A Amphiphilic, segmented copolymer of controlled morphology and ophthalmic devices including contact lenses made therefrom CIBA VISION CORPORATION (US) 1998-09-15 US claimed
WO-1997049740-A9 AMPHIPHILIC, SEGMENTED COPOLYMER OF CONTROLLED MORPHOLOGY AND OPHTHALMIC DEVICES INCLUDING CONTACT LENSES MADE THEREFROM 1998-04-30 WO claimed
EP-0834352-A1 Plasma-induced polymer coatings CIBA-GEIGY AG (CH) 1998-04-08 EP claimed
WO-1997049740-A1 AMPHIPHILIC, SEGMENTED COPOLYMER OF CONTROLLED MORPHOLOGY AND OPHTHALMIC DEVICES INCLUDING CONTACT LENSES MADE THEREFROM NOVARTIS AG (CH) 1997-12-31 WO claimed
WO-1997021497-A1 PLASMA-INDUCED POLYMER COATINGS NOVARTIS AG (CH) 1997-06-19 WO claimed
EP-0425436-B1 Reactive silicone and/or fluorine containing hydrophilic prepolymers and polymers thereof CIBA GEIGY AG (CH) 1996-12-27 EP claimed
US-5079319-A Contact Lenses CIBA-GEIGY CORPORATION (US) 1992-01-07 US claimed
EP-0425436-A2 Reactive silicone and/or fluorine containing hydrophilic prepolymers and polymers thereof CIBA-GEIGY AG (CH) 1991-05-02 EP claimed
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US claimed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US claimed