SCHEMBL165308

SCHEMBL165308

[CH2]C(O)(CO)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL178124 0.80
SCHEMBL6432723 0.78
SCHEMBL269968 0.78
SCHEMBL270529 0.73
SCHEMBL271773 0.70
SCHEMBL2806747 0.70
SCHEMBL6437208 0.67
SCHEMBL1032719 0.67
SCHEMBL2063859 0.67
SCHEMBL462012 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024095926-A1 CLEANING LIQUID AND SUBSTRATE CLEANING METHOD 東京応化工業株式会社 2024-05-10 WO disclosed
US-20230174892-A1 DETERGENT COMPOSITION AND CHEMICAL-MECHANICAL POLISHING COMPOSITION DAICEL CORPORATION (JP) 2023-06-08 US disclosed
CN-115516073-A Cleaning agent composition and chemical mechanical polishing composition 株式会社大赛璐 2022-12-23 CN disclosed
US-10597609-B2 Cleaning liquid, anticorrosion agent, and method for manufacturing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2020-03-24 US disclosed
US-10597616-B2 Cleaning liquid and method for manufacturing the same TOYOTA OHKA KOGYO CO., LTD. (JP) 2020-03-24 US disclosed
WO-2018157976-A1 KIT OF COSMETIC SKINCARE COMPOSITIONS THE BOOTS COMPANY PLC (GB) 2018-09-07 WO disclosed
US-20180187133-A1 CLEANING LIQUID AND METHOD FOR MANUFACTURING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-05 US disclosed
US-20180187128-A1 CLEANING LIQUID, ANTICORROSION AGENT, AND METHOD FOR MANUFACTURING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2018-07-05 US disclosed
EP-2475000-B1 PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME WAKO PURE CHEM IND LTD (JP) 2015-07-01 EP disclosed
US-9034810-B2 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-19 US disclosed
US-20060141121-A1 Vegetable article, product containing the same and process for producing vegetable article TOYO BOSEKI KABUSHIKI KAISYA (JP) 2006-06-29 US disclosed
EP-0264106-B1 5-Substituted amino-4-hydroxy-pentanoic acid derivatives and their use BANYU PHARMA CO LTD (JP) 1994-03-16 EP disclosed
EP-0272583-B1 5-SUBSTITUTED AMINO-4-HYDROXY-PENTENOIC ACID DERIVATIVES AND THEIR USE Banyu Pharmaceutical Co., Ltd. (JP) 1993-09-15 EP disclosed
US-4927565-A HYPOTENSIVE AGENT BANYU PHARMACEUTICAL CO., LTD. (JP) 1990-05-22 US disclosed
US-4851387-A RENIN INHIBITORS BANYU PHARMACEUTICAL CO., LTD. (JP) 1989-07-25 US disclosed
EP-0272583-A2 5-Substituted amino-4-hydroxy-pentenoic acid derivatives and their use Banyu Pharmaceutical Co., Ltd. (JP) 1988-06-29 EP disclosed
EP-0264106-A2 5-Substituted amino-4-hydroxy-pentanoic acid derivatives and their use Banyu Pharmaceutical Co., Ltd. (JP) 1988-04-20 EP disclosed
US-4240943-A WATER DISPERSIBLE URETHANE PREPOLYMER AND WATER SOLUBLE METHYLOL COMPOUND, GLYOXALAMIDE ADDUCT OR BIS-HYDROXYETHYL SULFONE DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) 1980-12-23 US disclosed
US-4092107-A WASH AND WEAR, CREASE RESISTANCE, SOIL RELEASE, ACRYLIC ESTER POLYMERS AKZONA INCORPORATED (US) 1978-05-30 US disclosed
US-4018959-A Corrugating adhesive compositions containing thermoplastic polymer, thermosetting resin, and starch NATIONAL STARCH AND CHEMICAL CORPORATION (US) 1977-04-19 US disclosed