Benzophenone

Benzophenone

SCHEMBL1655009

CCC(Cc1ccccc1)(C(=O)c1ccc(N2CCOCC2)cc1)N(C)C.O=C(c1ccccc1)c1ccccc1

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.45
HPGD P15428 4/20 0.45
SMN1; SMN2 Q16637 6/20 0.45
MAPT P10636 5/20 0.45
NPC1 O15118 4/20 0.45
TSHR P16473 3/20 0.45
TP53 P04637 3/20 0.45
RAB9A P51151 3/20 0.45
HSD17B10 Q99714 2/20 0.45
ALOX15 P16050 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
LMNA P02545 1/20 0.45
STAT1 P42224 1/20 0.45
PIK3CD O00329 1/20 0.45
PIK3CA P42336 1/20 0.45
PIK3CB P42338 1/20 0.45
PIK3CG P48736 1/20 0.45
PRKDC P78527 1/20 0.45
USP2 O75604 1/20 0.43
ESR1 P03372 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28131034 0.96 SMN1; SMN2 (0.48) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL3397043 0.96 SMN1; SMN2 (0.48) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL35868 0.96 SMN1; SMN2 (0.48) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL28990186 0.96 SMN1; SMN2 (0.48) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
Propane SCHEMBL27565501 0.95 SMN1; SMN2 (0.47) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
Formaldehyde SCHEMBL28335498 0.94 SMN1; SMN2 (0.46) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL4652457 0.94 SMN1; SMN2 (0.46) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL20598742 0.93 AOC3 (0.46) ALDH1A1SMN1; SMN2MAPTL3MBTL1LMNA
SCHEMBL4659495 0.92 MAPT (0.46) ALDH1A1HPGDSMN1; SMN2MAPTNPC1
SCHEMBL7804774 0.92 SMN1; SMN2 (0.43) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180208700-A1 (METH)ACRYLIC BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2018-07-26 US disclosed
US-8586284-B2 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-19 US disclosed
US-20110086309-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-04-14 US disclosed