SCHEMBL1655387

SCHEMBL1655387

C[C]1CCCCC1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17675677 0.76
SCHEMBL4017056 0.70
SCHEMBL974915 0.69
SCHEMBL20038895 0.69 KDM4E (0.39)
SCHEMBL4468 0.69
SCHEMBL14394191 0.69
SCHEMBL10683142 0.69 UGT2B17 (0.31)
SCHEMBL9981000 0.69 CA1 (0.31)
SCHEMBL11516861 0.67
SCHEMBL17983462 0.67 NPY1R (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3080113-B1 FUSED TRICYCLIC IMIDAZOLE DERIVATIVES AS MODULATORS OF TNF ACTIVITY UCB BIOPHARMA SPRL (BE) 2019-09-18 EP claimed
EP-3080113-B1 FUSED TRICYCLIC IMIDAZOLE DERIVATIVES AS MODULATORS OF TNF ACTIVITY UCB BIOPHARMA SPRL (BE) 2019-09-18 EP disclosed
US-10087179-B2 Fused tricyclic imidazole derivatives as modulators of TNF activity UCB BIOPHARMA SPRL (BE) 2018-10-02 US disclosed
US-20160376268-A1 Fused Tricyclic Imidazole Derivatives As Modulators of TNF Activity SANOFI (FR) 2016-12-29 US disclosed
EP-3080113-A1 FUSED TRICYCLIC IMIDAZOLE DERIVATIVES AS MODULATORS OF TNF ACTIVITY UCB Biopharma SPRL (BE) 2016-10-19 EP disclosed
WO-2015086526-A1 FUSED TRICYCLIC IMIDAZOLE DERIVATIVES AS MODULATORS OF TNF ACTIVITY UCB BIOPHARMA SPRL (BE) 2015-06-18 WO disclosed
US-8586284-B2 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-19 US disclosed
US-7981706-B2 Photoresist composition and method of manufacturing a display substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-07-19 US disclosed
US-20110097835-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD (KR) 2011-04-28 US disclosed
US-20110086309-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-04-14 US disclosed