SCHEMBL1656159

SCHEMBL1656159

FC(F)=CC(F)=C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2866556 0.65
SCHEMBL777885 0.64
SCHEMBL774934 0.61
Tetrafluoroethylene SCHEMBL28186783 0.59
SCHEMBL1556140 0.58
SCHEMBL1556408 0.58
SCHEMBL1375221 0.58
SCHEMBL4208016 0.58
SCHEMBL4084687 0.58
SCHEMBL14891996 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240025825-A1 A PROCESS FOR THE PURIFICATION OF FLUORINATED OLEFINS SOLVAY SA (BE) 2024-01-25 US claimed
CN-116348439-A Process for purifying fluorinated olefins 索尔维公司 2023-06-27 CN claimed
US-12261050-B2 Method of manufacturing semiconductor device, and etching gas KIOXIA CORPORATION (JP) 2025-03-25 US disclosed
US-20240025825-A1 A PROCESS FOR THE PURIFICATION OF FLUORINATED OLEFINS SOLVAY SA (BE) 2024-01-25 US disclosed
US-20230307244-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ETCHING GAS KIOXIA CORPORATION (JP) 2023-09-28 US disclosed
CN-116348439-A Process for purifying fluorinated olefins 索尔维公司 2023-06-27 CN disclosed
US-20200377434-A1 METHOD OF PRODUCING COMPOUND HAVING BUTADIENE SKELETON CONTAINING HYDROGEN AND FLUORINE AND/OR CHLORINE KANTO DENKA KOGYO CO., LTD. (JP) 2020-12-03 US disclosed
CN-106233436-B Method for increasing etching rate of silicon etching process by etching chamber pretreatment 国际商业机器公司 2020-01-07 CN disclosed
CN-110546125-A method for producing compound having butadiene skeleton containing hydrogen and fluorine and/or chlorine KANTO DENKA KOGYO KK 2019-12-06 CN disclosed
US-10435293-B2 Methods of manufacturing energy conversion materials fabricated with boron nitride nanotubes (BNNTs) and BNNT polymer composites NATIONAL INSTITUTE OF AEROSPACE ASSOCIATES (US) 2019-10-08 US disclosed
US-9711365-B2 Etch rate enhancement for a silicon etch process through etch chamber pretreatment INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2017-07-18 US disclosed
WO-2011046602-A1 ENERGY CONVERSION MATERIALS FABRICATED WITH BORON NITRIDE NANOTUBES (BNNTS) AND BNNT POLYMER COMPOSITES NATIONAL INSTITUTE OF AEROSPACE ASSOCIATES (US) 2011-04-21 WO disclosed
US-20100264116-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-10-21 US disclosed
EP-2194569-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-06-09 EP disclosed
US-7648922-B2 Fluorocarbon film and method for forming same KYOTO UNIVERSITY (JP) 2010-01-19 US disclosed
US-20070020951-A1 Fluorocarbon film and method for forming same ZEON CORPORATION (JP) 2007-01-25 US disclosed
US-20070003737-A1 Polymer to gold adhesion improvement by chemical and mechanical gold surface roughening INTEL CORPORATION 2007-01-04 US disclosed
US-5231143-A High-temperature oil-resistant elastomers THE B. F. GOODRICH COMPANY (US) 1993-07-27 US disclosed
WO-1991009061-A2 HIGH-TEMPERATURE OIL-RESISTANT ELASTOMERS THE B.F. GOODRICH COMPANY (US) 1991-06-27 WO disclosed
US-4994527-A High temperature, oil-resistant elastomers from hydrogenated copolymers of 1,3-dienes containing fluorine THE B. F. GOODRICH COMPANY (US) 1991-02-19 US disclosed