SCHEMBL16589502

SCHEMBL16589502

CC(C)(C)OC(=O)N1CCCC1OC=O

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.47
HPGD P15428 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.41
NPC1 O15118 1/20 0.41
EPHX1 P07099 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
USP2 O75604 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9977348 1.00 HSD17B10 (0.47) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL15430147 1.00 HSD17B10 (0.47) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL16352852 0.95 HPGD (0.46) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL15221624 0.95 HPGD (0.46) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL4916290 0.90 HSD17B10 (0.40) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL9977242 0.82 HSD17B10 (0.50) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL16590799 0.82 TSHR (0.40)
SCHEMBL14457242 0.82 HSD17B10 (0.50) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
SCHEMBL925960 0.82 HSD17B10 (0.50) HSD17B10HPGDSMN1; SMN2NPC1EPHX1
Methyl Alcohol SCHEMBL72605 0.81 HSD17B10 (0.49) HSD17B10HPGDSMN1; SMN2NPC1EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250525-B2 Resist underlayer film-forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-02-02 US disclosed
US-20150362838-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2015-12-17 US disclosed
US-9212255-B2 Resist underlayer film-forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-15 US disclosed
US-20150087155-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-26 US disclosed