SCHEMBL16608923

SCHEMBL16608923

CCCCCCOCN(CCCCCC)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.47
ZDHHC20 Q5W0Z9 3/20 0.44
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.41
CA12 O43570 2/20 0.40
CA1 P00915 2/20 0.40
CA9 Q16790 2/20 0.40
NAAA Q02083 1/20 0.40
CA2 P00918 1/20 0.40
HCAR2 Q8TDS4 1/20 0.39
EPHX1 P07099 1/20 0.38
DNM1 Q05193 1/20 0.38
TSHR P16473 1/20 0.38
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
ZDHHC2 Q9UIJ5 1/20 0.37
PLA2G2C Q5R387 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14763841 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL1416383 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL78938 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL25230061 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL7652815 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL25272614 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL14763241 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL4623644 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL4622713 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1
SCHEMBL4623978 0.80 CA12 (0.52) ZDHHC20MEN1KMT2ACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9632410-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device FUJIFILM CORPORATION (JP) 2017-04-25 US disclosed
US-20160018732-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-21 US disclosed
US-20150093692-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME FUJIFILM CORPORATION (JP) 2015-04-02 US disclosed