Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPM1B | O75688 | 2/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.40 |
| ▸ | PPP1CC | P36873 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.31 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.31 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22044407 | 0.84 | PPM1B (0.36) | PPM1BPTPN1PPP1CCKMT2AMEN1 | |
| SCHEMBL15081154 | 0.81 | — | — | |
| SCHEMBL26489433 | 0.74 | — | — | |
| SCHEMBL22972420 | 0.68 | — | — | |
| SCHEMBL15854506 | 0.66 | — | — | |
| SCHEMBL10150478 | 0.66 | PPM1B (0.44) | PPM1BPTPN1PPP1CCKMT2AMEN1 | |
| SCHEMBL14189734 | 0.65 | PPM1B (0.52) | PPM1BPTPN1PPP1CCKMT2AMEN1 | |
| SCHEMBL10050521 | 0.65 | PPM1B (0.52) | PPM1BPTPN1PPP1CCKMT2AMEN1 | |
| SCHEMBL8400471 | 0.65 | PPM1B (0.52) | PPM1BPTPN1PPP1CCKMT2AMEN1 | |
| SCHEMBL14189733 | 0.65 | PPM1B (0.52) | PPM1BPTPN1PPP1CCKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20150093692-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |