Fluoride Ion

Fluoride Ion

SCHEMBL16615998

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nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL31742568 1.00 — —
Fluoride Ion SCHEMBL10766731 0.82 — —
Fluoride Ion SCHEMBL194658 0.82 — —
Fluoride Ion SCHEMBL181692 0.82 — —
Fluoride Ion SCHEMBL18835135 0.67 — —
Fluoride Ion SCHEMBL17203214 0.67 — —
Fluoride Ion SCHEMBL21715136 0.67 — —
Fluoride Ion SCHEMBL22124633 0.67 — —
Fluoride Ion SCHEMBL12803687 0.67 — —
Fluoride Ion SCHEMBL7122326 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2868766-B1 THERMAL SPRAY MATERIAL AND METHOD FOR MANUFACTURING SAME NIPPON YTTRIUM CO LTD (JP) 2019-01-09 — — EP disclosed
US-9708187-B2 Thermal spray material NIPPON YTTRIUM CO., LTD. (JP) 2017-07-18 — — US disclosed
US-9388485-B2 Thermal spray material and process for preparing same NIPPON YTTRIUM CO., LTD. (JP) 2016-07-12 — — US disclosed
EP-2868766-A1 THERMAL SPRAY MATERIAL AND METHOD FOR MANUFACTURING SAME Nippon Yttrium Co., Ltd. (JP) 2015-05-06 — — EP disclosed
US-20150111037-A1 THERMAL SPRAY MATERIAL MITSUI MINING & SMELTING CO., LTD. (JP) 2015-04-23 — — US disclosed
US-20150096462-A1 THERMAL SPRAY MATERIAL AND PROCESS FOR PREPARING SAME MITSUI MINING & SMELTING CO., LTD. (JP) 2015-04-09 — — US disclosed
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