SCHEMBL16622190

SCHEMBL16622190

CCCCNS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.55

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.55
CA2 P00918 17/20 0.49
CA1 P00915 16/20 0.49
MMP1 P03956 6/20 0.49
MMP2 P08253 6/20 0.49
MMP9 P14780 6/20 0.49
MMP8 P22894 6/20 0.49
MMP13 P45452 6/20 0.49
CA12 O43570 1/20 0.47
CA7 P43166 1/20 0.47
CA14 Q9ULX7 1/20 0.47
PPARA Q07869 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9068350 0.98 EPHX1 (0.53) EPHX1CA2CA1MMP1MMP2
SCHEMBL3177043 0.98 EPHX1 (0.53) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042176 0.95 EPHX1 (0.62) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042175 0.94 EPHX1 (0.56) EPHX1CA2CA1MMP1MMP2
SCHEMBL10876500 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042172 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042351 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042251 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2
SCHEMBL19042238 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2
SCHEMBL10881595 0.93 EPHX1 (0.66) EPHX1CA2CA1MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20170184964-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184962-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
CN-105396254-A Fluorine-containing complex function extinguishing material XIANGYANG CANGHAI TECH CO LTD 2016-03-16 CN disclosed
US-8999298-B2 Dental oral composition NATIONAL UNIVERSITY CORPORATION OKAYAMA UNIVERSITY (JP) 2015-04-07 US disclosed