⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28190813 | 0.50 | — | — | |
| SCHEMBL28095741 | 0.41 | — | — | |
| SCHEMBL28382699 | 0.41 | — | — | |
| SCHEMBL64004 | 0.41 | — | — | |
| SCHEMBL461163 | 0.35 | — | — | |
| SCHEMBL3386 | 0.35 | — | — | |
| SCHEMBL6559802 | 0.35 | — | — | |
| SCHEMBL11426107 | 0.35 | — | — | |
| Charcoal, Activated SCHEMBL7170024 | 0.35 | — | — | |
| SCHEMBL11430022 | 0.35 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2311918-B1 | Ink composition, and inkjet recording method | FUJIFILM CORP (JP) | 2014-10-22 | — | — | EP | disclosed |
| US-8211508-B2 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers | FUJIFILM CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| EP-2311918-A1 | Ink composition, and inkjet recording method | FUJIFILM Corporation (JP) | 2011-04-20 | — | — | EP | disclosed |
| US-20080075882-A1 | PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |