SCHEMBL16639654

SCHEMBL16639654

C=C(C)C(=O)NCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOCCOC

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
SMN1; SMN2 Q16637 3/20 0.41
THRB P10828 2/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
TDP1 Q9NUW8 1/20 0.38
ALDH1A1 P00352 1/20 0.37
ABCB11 O95342 1/20 0.36
CYP3A4 P08684 1/20 0.36
ADRA2B P18089 1/20 0.36
OPRD1 P41143 1/20 0.36
SCN5A Q14524 1/20 0.36
TSHR P16473 1/20 0.36
KDM4E B2RXH2 1/20 0.36
GLA P06280 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
EPHX2 P34913 2/20 0.35
STAT3 P40763 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29519256 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL29519640 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL29519320 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL16639653 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL2534629 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL29519181 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL28544589 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL16639658 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL16639652 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1
SCHEMBL554605 1.00 MEN1 (0.44) MEN1KMT2ASMN1; SMN2THRBNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150104746-A1 METHOD OF CONCENTRATING WASTE LIQUID PRODUCED BY DEVELOPMENT, AND METHOD OF RECYCLING WASTE LIQUID PRODUCED BY DEVELOPMENT FUJIFILM CORPORATION (JP) 2015-04-16 US disclosed