SCHEMBL1665194

SCHEMBL1665194

OC1(OC2CCCC2)CCCC1

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.39
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA9 Q16790 2/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14740237 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL8890018 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL901797 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL10784445 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL3276620 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL16718745 0.97 CYP2C19 (0.42) CYP2C19CA12CA1CA2CA9
SCHEMBL9103898 0.95 CYP2C19 (0.35) CYP2C19HSD17B10
SCHEMBL8451918 0.90 CYP2C19 (0.35) CYP2C19
SCHEMBL14775877 0.86
SCHEMBL8710848 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111212828-B Modified polymerization initiator and preparation method thereof LG化学株式会社 2023-07-21 CN claimed
CN-108299155-B Method for producing cyclopentanol and cyclopentanone from cyclopentene 中石化上海工程有限公司 2021-03-16 CN claimed
CN-118047920-A Conjugated diene copolymer, rubber, and method for producing same 台橡股份有限公司 2024-05-17 CN disclosed
CN-111212828-B Modified polymerization initiator and preparation method thereof LG化学株式会社 2023-07-21 CN disclosed
CN-108299155-B Method for producing cyclopentanol and cyclopentanone from cyclopentene 中石化上海工程有限公司 2021-03-16 CN disclosed
US-7919227-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-04-05 US disclosed