⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4211866 | 0.72 | — | — | |
| SCHEMBL22283 | 0.71 | — | — | |
| SCHEMBL4991976 | 0.71 | — | — | |
| SCHEMBL235326 | 0.71 | — | — | |
| SCHEMBL16668640 | 0.70 | — | — | |
| SCHEMBL2019151 | 0.69 | — | — | |
| SCHEMBL16669067 | 0.69 | — | — | |
| SCHEMBL16668653 | 0.69 | — | — | |
| SCHEMBL15360961 | 0.65 | — | — | |
| SCHEMBL1142806 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9425038-B2 | Method and apparatus for forming silicon oxycarbonitride film, silicon oxycarbide film and silicon oxynitride film | TOKYO ELECTRON LIMITED (JP) | 2016-08-23 | — | — | US | disclosed |
| US-20150118865-A1 | METHOD AND APPARATUS FOR FORMING SILICON OXYCARBONITRIDE FILM, SILICON OXYCARBIDE FILM AND SILICON OXYNITRIDE FILM | TOKYO ELECTRON LIMITED (JP) | 2015-04-30 | — | — | US | disclosed |