⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6534939 | 0.78 | — | — | |
| SCHEMBL1669344 | 0.78 | CYP3A4 (0.36) | — | |
| SCHEMBL18260152 | 0.74 | — | — | |
| SCHEMBL9504587 | 0.74 | — | — | |
| SCHEMBL7603381 | 0.74 | — | — | |
| SCHEMBL18404538 | 0.72 | — | — | |
| SCHEMBL27925099 | 0.72 | — | — | |
| SCHEMBL27638105 | 0.72 | — | — | |
| SCHEMBL28780046 | 0.72 | — | — | |
| SCHEMBL7182451 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384671-A1 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230226814-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20210146675-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLANOGRAPHIC PRINTING PLATE PRECURSOR LAMINATE, PLATE-MAKING METHOD FOR PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2021-05-20 | — | — | US | disclosed |
| US-20200392359-A1 | INK JET INK COMPOSITION, METHOD FOR PRODUCING THE SAME, AND IMAGE-FORMING METHOD | FUJIFILM CORPORATION (JP) | 2020-12-17 | — | — | US | disclosed |
| EP-2732460-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | Fujifilm Corporation (JP) | 2014-05-21 | — | — | EP | disclosed |
| WO-2013008940-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | WO | disclosed |
| WO-2011126131-A1 | PATTERN FORMING METHOD AND PROCESS FOR PRODUCING PATTERN SUBSTRATES | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | WO | disclosed |
| WO-2011040635-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-04-07 | — | — | WO | disclosed |