Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Lithium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28094320 | 0.93 | — | — | |
| Lithium Ion SCHEMBL230656 | 0.93 | — | — | |
| Lithium Ion SCHEMBL1674447 | 0.93 | — | — | |
| Lithium Ion SCHEMBL28946458 | 0.86 | — | — | |
| Lithium Ion SCHEMBL28111483 | 0.86 | — | — | |
| Lithium Ion SCHEMBL29467249 | 0.86 | — | — | |
| Lithium Ion SCHEMBL28553106 | 0.86 | — | — | |
| Lithium Ion SCHEMBL28111490 | 0.86 | — | — | |
| Lithium Ion SCHEMBL28111486 | 0.86 | — | — | |
| Lithium Ion SCHEMBL28111493 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1908179-B1 | NON-CRITICAL PHASE MATCHING IN CLBO TO GENERATE SUB-213NM WAVELENGHTS | KLA TENCOR TECH CORP (US) | 2014-04-23 | — | — | EP | disclosed |
| EP-2369695-B1 | Fiber amplifier based light source for semiconductor inspection | KLA TENCOR TECH CORP (US) | 2013-11-13 | — | — | EP | disclosed |
| EP-2369695-A2 | Fiber amplifier based light source for semiconductor inspection | KLA-Tencor Technologies Corporation (US) | 2011-09-28 | — | — | EP | disclosed |
| US-7924892-B2 | Fiber amplifier based light source for semiconductor inspection | KLA-TENCOR TECHNOLOGIES CORPORATION (US) | 2011-04-12 | — | — | US | disclosed |
| US-7627007-B1 | Non-critical phase matching in CLBO to generate sub-213nm wavelengths | KLA-TENCOR TECHNOLOGIES CORPORATION (US) | 2009-12-01 | — | — | US | disclosed |
| EP-1908179-A2 | NON-CRITICAL PHASE MATCHING IN CLBO TO GENERATE SUB-213NM WAVELENGHTS | KLA-Tencor Technologies Corporation (US) | 2008-04-09 | — | — | EP | disclosed |
| EP-1782510-A2 | FIBER AMPLIFIED BASED LIGHT SOURCE FOR SEMICONDUCTOR INSPECTION | KLA-Tencor Technologies Corporation (US) | 2007-05-09 | — | — | EP | disclosed |
| WO-2007016217-A2 | NON-CRITICAL PHASE MATCHING IN CLBO TO GENERATE SUB-213NM WAVELENGHTS | KLA-TENCOR TECHNOLOGIES CORPORATION (US) | 2007-02-08 | — | — | WO | disclosed |
| WO-2006023448-A2 | FIBER AMPLIFIED BASED LIGHT SOURCE FOR SEMICONDUCTOR INSPECTION | KLA-TENCOR TECHNOLOGIES CORPORATION (US) | 2006-03-02 | — | — | WO | disclosed |
| US-20060045163-A1 | Fiber amplifier based light source for semiconductor inspection | KLA-TENCOR TECHNOLOGIES CORPORATION | 2006-03-02 | — | — | US | disclosed |