SCHEMBL1674817

SCHEMBL1674817

C=C([SiH3])C(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7856645 0.69
SCHEMBL677150 0.69
SCHEMBL2273482 0.69
SCHEMBL9450709 0.69
SCHEMBL8707980 0.67
SCHEMBL12703123 0.67
SCHEMBL18782834 0.67 TSHR (0.39)
SCHEMBL2134864 0.67
SCHEMBL10638127 0.67
SCHEMBL2272217 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119315105-A Additive for electrolyte, electrode assembly, battery, and electricity-using device 宁德时代新能源科技股份有限公司 2025-01-14 CN claimed
US-20170166677-A1 METHOD FOR MAKING SINGLE ION NANOCONDUCTOR JIANGSU HUADONG INSTITUTE OF LI-ION BATTERY CO., LTD. (CN) 2017-06-15 US claimed
US-20170170440-A1 METHOD FOR MAKING COMPOSITE SEPARATOR JIANGSU HUADONG INSTITUTE OF LI-ION BATTERY CO., LTD. (CN) 2017-06-15 US claimed
US-7943719-B2 Encapsulation resins The Regents of the University of California; (US) 2011-05-17 US claimed
EP-1172823-B1 Porous materials SHIPLEY CO LLC (US) 2007-11-28 EP claimed
EP-0498269-B1 Volatile liquid precursors for the chemical vapor deposition of copper AIR PROD & CHEM (US) 1997-03-26 EP claimed
US-5288891-A Reacting an unsaturated silicon compound and a perfluoralkyl peroxide; waterproofing; oil repellents; adhesion; optical lenses; mold release agents NIPPON OIL AND FATS CO. LTD. (JP) 1994-02-22 US claimed
US-5144049-A Organometallic copper complexes AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-09-01 US claimed
EP-0498269-A2 Volatile liquid precursors for the chemical vapor deposition of copper AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-08-12 EP claimed
US-20250389016-A1 GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM TOSOH CORP (JP) 2025-12-25 US disclosed
CN-118843711-A Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film 东曹株式会社 2024-10-25 CN disclosed
EP-3392277-B1 METHOD FOR PRODUCING SOLID CATALYST COMPONENT FOR ALPHA-OLEFIN POLYMERIZATION, AND METHOD FOR PRODUCING ALPHA-OLEFIN POLYMER USING SAME JAPAN POLYPROPYLENE CORP (JP) 2024-04-24 EP disclosed
WO-2024014503-A1 GAS BARRIER FILM MATERIAL, SILICON OXIDE FILM, AND PRODUCTION METHOD OF SILICON OXIDE FILM 東ソー株式会社 2024-01-18 WO disclosed
US-20230365733-A1 ORGANOSILICON COMPOUND GRAFT COPOLYMER AND RUBBER COMPOSITION FOR TIRE INCLUDING THE COPOLYMER MITSUI CHEMICALS, INC. (JP) 2023-11-16 US disclosed
EP-0498269-A2 Volatile liquid precursors for the chemical vapor deposition of copper AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-08-12 EP disclosed
EP-0487094-A1 Fluoroalkyl group-containing organosilicon oligomer, method for preparing same and surface treating agent NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1992-05-27 EP disclosed
US-5093418-A Grafted with unsaturated acid, ester, anhydride, vinylaromatic or unsaturated silane compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1992-03-03 US disclosed
US-5085731-A Silyl olefin stabilized organometallic complexes as precursory AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-02-04 US disclosed
US-4908411-A Ethylene, alpha olefin, grafted thereto unsaturated carboxylic acid, styrene hydrocarbon, unsaturated silane compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-03-13 US disclosed
EP-0183493-A2 Modified ethylenic random copolymer MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-06-04 EP disclosed