Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 7/20 | 0.47 |
| ▸ | TP53 | P04637 | 3/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | BCHE | P06276 | 2/20 | 0.42 |
| ▸ | ACHE | P22303 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27843501 | 0.89 | MEN1 (0.56) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL27869540 | 0.87 | MEN1 (0.51) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL27458254 | 0.86 | HTT (0.50) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL27509200 | 0.78 | MEN1 (0.49) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL14433006 | 0.74 | MAPT (0.47) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL31081454 | 0.74 | MAPT (0.43) | HTTMEN1KMT2AMAPTTP53 | |
| SCHEMBL31081672 | 0.73 | KMT2A (0.46) | HTTMEN1KMT2AMAPTALDH1A1 | |
| SCHEMBL1048524 | 0.73 | KMT2A (0.46) | HTTMEN1KMT2AMAPTALDH1A1 | |
| Bromide SCHEMBL3942399 | 0.72 | KMT2A (0.45) | HTTMEN1KMT2AMAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL3930735 | 0.72 | KMT2A (0.45) | HTTMEN1KMT2AMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-20150160554-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2015-06-11 | — | — | US | disclosed |