⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29116348 | 0.62 | — | — | |
| SCHEMBL7648923 | 0.61 | — | — | |
| SCHEMBL11216364 | 0.59 | — | — | |
| SCHEMBL9475278 | 0.59 | — | — | |
| SCHEMBL7571132 | 0.59 | — | — | |
| SCHEMBL11216365 | 0.59 | — | — | |
| SCHEMBL555115 | 0.58 | — | — | |
| SCHEMBL166599 | 0.53 | — | — | |
| Hydrochloric Acid SCHEMBL28526767 | 0.53 | — | — | |
| SCHEMBL6054660 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 575 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150344662-A1 | POLYETHERIMIDE POROUS BODY AND METHOD FOR PRODUCING SAME | NITTO DENKO CORPORATION (JP) | 2015-12-03 | — | — | US | claimed |
| EP-2933288-A1 | POLYETHERIMIDE POROUS BODY AND METHOD FOR PRODUCING SAME | Nitto Denko Corporation (JP) | 2015-10-21 | — | — | EP | claimed |
| US-8664534-B2 | Printed wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-03-04 | — | — | US | claimed |
| US-8404564-B2 | Adhesive film for semiconductor, composite sheet, and method for producing semiconductor chip using them | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-03-26 | — | — | US | claimed |
| EP-0937451-B1 | Polyurethanes with carboxylate functionality for hair fixative applications | AKZO NOBEL NV (NL) | 2012-08-22 | — | — | EP | claimed |
| CN-101094879-B | Polysiloxane prepolymers for biomedical devices | BAUSCH & LOMB | 2011-08-10 | — | — | CN | claimed |
| US-20110121435-A1 | PHOTOSENSITIVE ADHESIVE COMPOSITION, FILMY ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-05-26 | — | — | US | claimed |
| CN-101094878-B | Polysiloxane prepolymers for biomedical devices | BAUSCH & LOMB | 2011-04-13 | — | — | CN | claimed |
| US-7871694-B2 | Prepreg, metal-clad laminate and printed circuit board using same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-01-18 | — | — | US | claimed |
| CN-101906212-A | Organic silicon block copolymer | SINOCHEM CORP | 2010-12-08 | — | — | CN | claimed |
| US-5874069-A | SOLID STICKS OR GELS; DECREASED TACK | COLGATE-PALMOLIVE COMPANY (US) | 1999-02-23 | — | — | US | claimed |
| EP-0891183-A1 | COSMETIC COMPOSITION CONTAINING AMIDES AND SILICON-MODIFIED WAXES | Colgate-Palmolive Company (US) | 1999-01-20 | — | — | EP | claimed |
| WO-1997036573-A1 | COSMETIC COMPOSITION CONTAINING AMIDES AND SILICON-MODIFIED WAXES | COLGATE-PALMOLIVE COMPANY (US) | 1997-10-09 | — | — | WO | claimed |
| US-5609914-A | APPLYING AN AQUEOUS INK IMAGEWISE TO THE NONPHOTOSENSITIVE LAYER TO CHANGE ITS SOLUBILITY, WASHING TO REMOVE SOLUBLE AREAS OF LAYER AND CURING POLYAMIC ACID TO FORM A POLYIMIDE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-03-11 | — | — | US | claimed |
| EP-0742487-A1 | Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-11-13 | — | — | EP | claimed |
| EP-0486724-B1 | Thermoplastic film die attach adhesives | NAT STARCH CHEM INVEST (US) | 1995-11-08 | — | — | EP | claimed |
| EP-0328027-B1 | Novel soluble polyimidesiloxanes and methods for their preparation and use | OCCIDENTAL CHEM CO (US) | 1995-09-20 | — | — | EP | claimed |
| EP-0395744-B1 | IMIDE-CONTAINING POLYSILOXANES AND A PROCESS FOR PREPARING THEM | LUCKY, LTD. (KR) | 1993-06-16 | — | — | EP | claimed |
| EP-0287479-B1 | THERMALLY STABLE POLYMERS BASED ON MALEIMIDES AND DIAMINE SILOXANES, AND PROCESS FOR THEIR PREPARATION | RHONE-POULENC CHIMIE (FR) | 1991-09-11 | — | — | EP | claimed |
| US-4847344-A | POLYSILOXANE COPOLYMERS, LAMINATION | RHONE-POULENC CHIMIE (FR) | 1989-07-11 | — | — | US | claimed |