SCHEMBL1684155

SCHEMBL1684155

Oc1cncnc1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30388054 0.78
SCHEMBL4985778 0.78
SCHEMBL13971735 0.72
SCHEMBL2799076 0.72
SCHEMBL5309066 0.72
Fluoxidine SCHEMBL784774 0.72
SCHEMBL4767840 0.72
SCHEMBL1760847 0.72
SCHEMBL526804 0.72
SCHEMBL9779758 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119371360-A 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-01-28 CN claimed
EP-0658308-A1 HERBICIDAL COMPOUND AND METHOD OF CONTROLLING UNWANTED VEGETATION KARE LTD (LV) 1995-06-21 EP claimed
CN-119371360-B 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-10-24 CN disclosed
CN-119371360-B 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-10-24 CN disclosed
CN-119371360-A 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-01-28 CN disclosed
CN-119371360-A 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-01-28 CN disclosed
CN-119371360-A 5, 6-Dihydroxypyrimidine compound and preparation method and application thereof 暨南大学 2025-01-28 CN disclosed
CN-117425654-A 2, 8-diazaspiro [4.5] decane compounds 基因泰克公司 2024-01-19 CN disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed
US-11487204-B2 Resist material DIC CORPORATION (JP) 2022-11-01 US disclosed
US-20200166838-A1 RESIST MATERIAL DIC CORPORATION (JP) 2020-05-28 US disclosed
EP-0399403-A1 Electrophotographic photoreceptor FUJI PHOTO FILM CO., LTD. (JP) 1990-11-28 EP disclosed
EP-0391399-A1 Electrophotographic photoreceptor FUJI PHOTO FILM CO., LTD. (JP) 1990-10-10 EP disclosed
EP-0371312-A1 Benzoxazine derivatives MERCK PATENT GmbH (DE) 1990-06-06 EP disclosed
EP-0222210-B1 PROCESS FOR PREPARING PHOSPHORIC-ACID DERIVATIVES AND INTERMEDIATES BAYER AG (DE) 1990-03-28 EP disclosed
US-4769458-A Process for the preparation of phosphoric acid derivatives and intermediate products BAYER AKTIENGESELLSCHAFT (DE) 1988-09-06 US disclosed
EP-0167888-B1 PROCESS FOR PREPARING PHOSPHORIC-ACID DERIVATIVES AND INTERMEDIATE COMPOUNDS BAYER AG (DE) 1988-08-17 EP disclosed
US-4686290-A Preparation of pyrimidyl phosphoric acid derivatives and intermediates BAYER AKTIENGESELLSCHAFT (DE) 1987-08-11 US disclosed
EP-0222210-A2 Process for preparing phosphoric-acid derivatives and intermediates BAYER AG (DE) 1987-05-20 EP disclosed
EP-0167888-A1 Process for preparing phosphoric-acid derivatives and intermediate compounds BAYER AG (DE) 1986-01-15 EP disclosed