SCHEMBL16855014

SCHEMBL16855014

CC(C)(N)C(O)C(C)(C)N

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
FDPS P14324 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26783473 0.85 TSHR (0.33) TSHR
SCHEMBL4436240 0.79 CETP (0.35)
SCHEMBL795854 0.78
Hydrochloric Acid SCHEMBL8777199 0.77 CETP (0.33)
Hydrochloric Acid SCHEMBL8777188 0.77 CETP (0.33)
Hydrochloric Acid SCHEMBL8777184 0.77 CETP (0.33)
Fluoride SCHEMBL4617083 0.75
Hydrochloric Acid SCHEMBL5157348 0.75
SCHEMBL113474 0.75
Water SCHEMBL2817955 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115404039-A Polyurethane adhesive and preparation method and application thereof 杭州之江有机硅化工有限公司 2022-11-29 CN claimed
CN-102272675-A A photoresist image-forming process using double patterning 2011-12-07 CN claimed
CN-115404039-B Polyurethane adhesive and preparation method and application thereof 杭州之江有机硅化工有限公司 2023-06-16 CN disclosed
CN-115404039-A Polyurethane adhesive and preparation method and application thereof 杭州之江有机硅化工有限公司 2022-11-29 CN disclosed
CN-109863187-A Resin composition for damping material 科思创德国股份有限公司 2019-06-07 CN disclosed
CN-109475650-A Phase stable, sprayable, freshening compositions comprising suspended particles 宝洁公司 2019-03-15 CN disclosed
WO-2015094444-A1 SUGAR-FREE SWEETENER BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) 2015-06-25 WO disclosed
CN-102272675-A A photoresist image-forming process using double patterning 2011-12-07 CN disclosed