⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL15687714 | 1.00 | — | — | |
| Fluoride SCHEMBL17495352 | 1.00 | — | — | |
| Fluoride SCHEMBL29034359 | 0.82 | — | — | |
| Fluoride SCHEMBL5140097 | 0.82 | — | — | |
| Fluoride SCHEMBL38465 | 0.71 | — | — | |
| Fluoride SCHEMBL9318976 | 0.71 | — | — | |
| F-18 SCHEMBL117749 | 0.71 | — | — | |
| Fluoride SCHEMBL32085 | 0.71 | — | — | |
| Fluoride SCHEMBL7924055 | 0.71 | — | — | |
| Fluoride SCHEMBL49263 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4545614-A1 | POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Samsung Electronics Co., Ltd (KR) | 2025-04-30 | — | — | EP | claimed |
| CN-119875513-A | Polishing slurry and method for manufacturing semiconductor device | 三星电子株式会社 | 2025-04-25 | — | — | CN | claimed |
| US-20250129267-A1 | POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-04-24 | — | — | US | claimed |
| US-20250011624-A1 | POLISHING SLURRY, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-09 | — | — | US | claimed |
| US-12189269-B2 | Orthogonal-phase BaGa4Se7 compound, orthogonal-phase BaGa4Se7 nonlinear optical crystal as well as preparation method and application thereof | TIANJIN UNIVERSITY OF TECHNOLOGY (CN) | 2025-01-07 | — | — | US | claimed |
| CN-118314985-B | System and method for treating polluted soil of refuse landfill | 四川省科源工程技术测试中心有限责任公司 | 2024-10-15 | — | — | CN | claimed |
| CN-118314985-A | System and method for treating polluted soil of refuse landfill | 四川省科源工程技术测试中心有限责任公司 | 2024-07-09 | — | — | CN | claimed |
| US-20230357616-A1 | COMPOSITE ABRASIVE, METHOD OF PREPARING SAME, POLISHING SLURRY INCLUDING SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-11-09 | — | — | US | claimed |
| EP-4273205-A2 | COMPOSITE ABRASIVE, METHOD OF PREPARING SAME, POLISHING SLURRY INCLUDING SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Samsung Electronics Co., Ltd. (KR) | 2023-11-08 | — | — | EP | claimed |
| CN-117004369-A | Composite abrasive, method of preparing the same, polishing slurry including the same, and method of manufacturing semiconductor device | 三星电子株式会社 | 2023-11-07 | — | — | CN | claimed |
| EP-1991284-A1 | BIOIMPLANTS FOR USE IN TISSUE GROWTH | Barralet, Jake (CA) | 2008-11-19 | — | — | EP | claimed |
| WO-2007087718-A1 | BIOIMPLANTS FOR USE IN TISSUE GROWTH | BONEGRAFIX INC. (US) | 2007-08-09 | — | — | WO | claimed |
| US-20050151131-A1 | Polycrystalline thin-film solar cells | STATE OF OREGON ACTING BY AND THROUGH THE STATE BOARD OF HIGHER EDUCATION ON BEHALF OF OREGON STATE UNIVERSITY | 2005-07-14 | — | — | US | claimed |
| EP-1380855-A2 | Apparatus and process for fluorination treatment of substrates | Showa Denko K.K. (JP) | 2004-01-14 | — | — | EP | claimed |
| US-20040006249-A1 | Fluorination treatment apparatus, process for producing fluorination treated substance, and fluorination treated substance | SHOWA DENKO K.K., NIKON CORPORATION | 2004-01-08 | — | — | US | claimed |
| WO-2003105238-A1 | POLYCRYSTALLINE THIN-FILM SOLAR CELLS | THE STATE OF OREGON ACTING BY AND THROUGH THE STATE BOARD OF HIGHER EDUCATION ON BEHALF OF OREGON STATE UNIVERSITY (US) | 2003-12-18 | — | — | WO | claimed |
| EP-0242942-B1 | OPTICAL RECORDING MEDIUM AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI KASEI CORPORATION (JP) | 1992-01-29 | — | — | EP | claimed |
| US-4839207-A | RECORDING LAYER CONTAINS SELENIUM, TELLURIUM, AND FLUORINE | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1989-06-13 | — | — | US | claimed |
| EP-0242942-A2 | Optical recording medium and process for producing the same | MITSUBISHI KASEI CORPORATION (JP) | 1987-10-28 | — | — | EP | claimed |
| US-4670614-A | HIGH OCTANE GASOLINE | RESEARCH ASSOCIATION FOR PETROLEUM ALTERNATIVE DEVELOPMENT (JP) | 1987-06-02 | — | — | US | claimed |