Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB4 | P30926 | 4/20 | 0.66 |
| ▸ | CHRNA3 | P32297 | 4/20 | 0.66 |
| ▸ | CHRNB2 | P17787 | 3/20 | 0.59 |
| ▸ | CHRNA4 | P43681 | 3/20 | 0.59 |
| ▸ | TLR4 | O00206 | 1/20 | 0.49 |
| ▸ | TLR2 | O60603 | 1/20 | 0.49 |
| ▸ | APP | P05067 | 1/20 | 0.49 |
| ▸ | KDM1A | O60341 | 1/20 | 0.48 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.48 |
| ▸ | CNR2 | P34972 | 1/20 | 0.47 |
| ▸ | CNR1 | P21554 | 1/20 | 0.47 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17534232 | 1.00 | CHRNB4 (0.66) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL29639202 | 1.00 | CHRNB4 (0.66) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL22816951 | 0.93 | CHRNB4 (0.62) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL27996245 | 0.91 | CHRNB4 (0.60) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL3098610 | 0.89 | CHRNB4 (0.57) | CHRNB4CHRNA3CHRNB2CHRNA4APP | |
| SCHEMBL21944935 | 0.88 | CHRNB4 (0.54) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL21944829 | 0.88 | CHRNB4 (0.54) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL3103428 | 0.87 | CHRNB4 (0.56) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL13096985 | 0.86 | CHRNB4 (0.55) | CHRNB4CHRNA3CHRNB2CHRNA4TLR4 | |
| SCHEMBL20744518 | 0.82 | GRIN2D (0.55) | CHRNB4CHRNA3CHRNB2CHRNA4KDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |