Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | GPBAR1 | Q8TDU6 | 1/20 | 0.54 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.54 |
| ▸ | PRSS1 | P07477 | 7/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.49 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.49 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.48 |
| ▸ | GGPS1 | O95749 | 2/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16902886 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902887 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902881 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902884 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902896 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL7254533 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902889 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902882 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL16902899 | 0.98 | TSHR (0.53) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 | |
| SCHEMBL10602833 | 0.96 | TSHR (0.54) | TSHRSMN1; SMN2GPBAR1CYSLTR1PRSS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |