SCHEMBL169034

SCHEMBL169034

O=C1CCCN1CC=CO

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
PIK3CD O00329 1/20 0.46
KMT2A Q03164 3/20 0.43
CHRM2 P08172 3/20 0.42
CHRM5 P08912 3/20 0.42
CHRM1 P11229 3/20 0.42
CHRM3 P20309 3/20 0.42
CYP2D6 P10635 2/20 0.42
CYP1A2 P05177 1/20 0.42
CHRM4 P08173 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
BLM P54132 1/20 0.41
HTT P42858 1/20 0.39
LMNA P02545 3/20 0.39
ALDH1A1 P00352 2/20 0.39
APEX1 P27695 2/20 0.39
PMP22 Q01453 2/20 0.39
ALOX12 P18054 1/20 0.39
NFKB1 P19838 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6543606 0.80 PIK3CD (0.50) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL19977291 0.80 CHRM2 (0.46) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL1682221 0.80 TSHR (0.48) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL11724283 0.78 CHRM2 (0.53) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL11724288 0.78 CHRM2 (0.53) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL24108794 0.78 TSHR (0.47) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL8088334 0.78 TSHR (0.56) TSHRPIK3CDKMT2ACHRM2CHRM5
SCHEMBL1981275 0.77
SCHEMBL4551202 0.77
SCHEMBL24108764 0.77 PIK3CD (0.43) TSHRPIK3CDKMT2ACHRM2CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2043 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230113775-A1 ANHYDROUS COMPOSITIONS OF EGFR INHIBITORS AND METHODS OF USE PALVELLA THERAPEUTICS, INC. (US) 2023-04-13 US claimed
WO-2023039470-A1 ANHYDROUS COMPOSITIONS OF EGFR INHIBITORS AND METHODS OF USE PALVELLA THERAPEUTICS, INC. (US) 2023-03-16 WO claimed
CN-111978703-A Temperature-control color-changing dimming material and application thereof 南京施瓦乐新材料科技有限公司 2020-11-24 CN claimed
US-20150133543-A1 TOPICAL GEL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND A SOLVENT MIXTURE LEO LABORATORIES LIMITED (IE) 2015-05-14 US claimed
EP-2858629-A1 A TOPICAL GEL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND A SOLVENT MIXTURE Leo Laboratories Limited (IE) 2015-04-15 EP claimed
US-20140350120-A1 TOPICAL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND AN OILY SOLVENT LEO LABORATORIES LIMITED (IE) 2014-11-27 US claimed
US-20140343141-A1 TOPICAL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND A SURFACTANT-COSOLVENT MIXTURE LEO LABORATORIES LIMITED (IE) 2014-11-20 US claimed
EP-2790669-A1 A TOPICAL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND AN OILY SOLVENT LEO LABORATORIES LIMITED (IE) 2014-10-22 EP claimed
EP-2790694-A1 A TOPICAL COMPOSITION COMPRISING AN INGENOL DERIVATIVE AND A SURFACTANT-COSOLVENT MIXTURE LEO LABORATORIES LIMITED (IE) 2014-10-22 EP claimed
WO-2014128564-A2 PHARMACEUTICAL COMPOSITIONS OF CETP INHIBITORS DR. REDDY'S LABORATORIES LTD. (IN) 2014-08-28 WO claimed
EP-0145973-A2 Positive photoresist stripping composition HMC Patents Holding Co., Inc. (US) 1985-06-26 EP claimed
US-4513076-A METAL COMPLEXES WITH ALKYL VINYL ETHER -MALEIC ANHYDRIDE GAF CORPORATION (US) 1985-04-23 US claimed
EP-0126652-A1 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-28 EP claimed
EP-0124274-A2 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-07 EP claimed
US-4460385-A Process for the removal of acid gases from hydrocarbon gases containing the same EXXON RESEARCH AND ENGINEERING CO. (US) 1984-07-17 US claimed
US-4448876-A Electron beam sensitive resist GAF CORPORATION (US) 1984-05-15 US claimed
US-4448875-A HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER GAF CORPORATION (US) 1984-05-15 US claimed
EP-0088977-A2 Electron beam sensitive resist GAF CORPORATION (US) 1983-09-21 EP claimed
EP-0084714-A1 Ink composition for ink jet printing KONICA CORPORATION (JP) 1983-08-03 EP claimed
US-4375398-A CROSSLINKING, VINYL ETHER GAF CORPORATION (US) 1983-03-01 US claimed