⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7628905 | 0.75 | — | — | |
| SCHEMBL16151175 | 0.62 | — | — | |
| SCHEMBL8927850 | 0.62 | — | — | |
| SCHEMBL14931233 | 0.58 | — | — | |
| SCHEMBL11012494 | 0.57 | — | — | |
| SCHEMBL8674628 | 0.57 | — | — | |
| SCHEMBL19628831 | 0.57 | — | — | |
| SCHEMBL19120956 | 0.54 | — | — | |
| SCHEMBL9147053 | 0.52 | — | — | |
| SCHEMBL11565768 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-9507262-B2 | Resist top-coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-29 | — | — | US | claimed |
| US-20150234278-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | claimed |
| US-20150234274-A1 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | claimed |
| US-12590219-B2 | Phenol compound, conductive paste composition, method for producing conductive paste composition, conductive wire, and method for producing conductive wire | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-31 | — | — | US | disclosed |
| EP-4654222-A1 | DEEP EUTECTIC LIQUID, BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-26 | — | — | EP | disclosed |
| US-20250352110-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250353969-A1 | Deep Eutectic Liquid, Bio-Electrode Composition, Bio-Electrode, And Method For Producing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4651157-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4492406-B1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING BIO-ELECTRODE | SHINETSU CHEMICAL CO (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20250345035-A1 | ULTRASONIC COUPLING MATERIAL COMPOSITE FILM AND ULTRASONIC INSPECTION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-4647466-A1 | ULTRASONIC COUPLING MATERIAL COMPOSITE FILM AND UNLTRASONIC INSPECTION METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-11-12 | — | — | EP | disclosed |
| US-20180193632-A1 | BIOMEDICAL ELECTRODE COMPOSITION, BIOMEDICAL ELECTRODE AND METHOD FOR MANUFACTURING THE BIOMEDICAL ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-07-12 | — | — | US | disclosed |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180085019-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180072930-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-9507262-B2 | Resist top-coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20150234278-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| US-20150234274-A1 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |