SCHEMBL170178

SCHEMBL170178

C[SiH2]C1(C2([SiH](C)C)CCCCO2)CCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21712516 0.98
SCHEMBL6745517 0.81
SCHEMBL22266032 0.81
SCHEMBL23928457 0.81
SCHEMBL27474112 0.81
SCHEMBL20302076 0.80
SCHEMBL9577986 0.80
SCHEMBL27546746 0.80
SCHEMBL4814454 0.80
SCHEMBL28506682 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118647651-A Compositions and methods for compatibilizing polyolefins 落基科技股份有限公司 2024-09-13 CN claimed
WO-2023160423-A1 POLYSILOXANE ELASTOMER HAVING HIGH TRANSPARENT CONDUCTIVITY AND PREPARATION METHOD THEREFOR 清华大学 2023-08-31 WO claimed
CN-115093708-A Polysiloxane elastomer with high transparent conductive performance and preparation method thereof 清华大学 2022-09-23 CN claimed
CN-113481730-B Super-hydrophobic self-cleaning surface with photocatalytic activity and self-repairing function and preparation method thereof 苏州大学 2022-04-29 CN claimed
CN-113152104-B Short-flow fluorine-free super-hydrophobic coating based on mercapto-alkene click reaction and preparation method and application thereof 苏州大学 2022-03-08 CN claimed
EP-1209492-B1 Formation of materials such as waveguides with a refractive index step NAT UNIV IRELAND CORK (IE) 2004-02-04 EP claimed
US-20020142096-A1 Induction gelation; optic diffraction; three-dimensional crosslinking CONNELL ANDREW (IE) 2002-10-03 US claimed
EP-1209492-A1 Formation of materials such as waveguides with a refractive index step National University of Ireland Cork (IE) 2002-05-29 EP claimed
EP-0518490-B1 Ink jet compositions containing desizing agents XEROX CORP (US) 1998-02-25 EP claimed
US-20260139436-A1 LIQUID INFUSED SURFACE-MODIFIED MATERIAL OMYA INTERNATIONAL AG (CH) 2026-05-21 US disclosed
US-12618309-B1 Methods for preventing corrosion in flexible pipe with passivating agents CHEVRON U.S.A. INC. (US) 2026-05-05 US disclosed
US-20260115352-A1 Verteporfin Containing Silicone Topical Skin Adhesive for Wound Closure and Reduced Scarring CILAG GMBH INT (CH) 2026-04-30 US disclosed
EP-3573461-B1 ANTIMICROBIAL, NON-THROMBOGENIC POLYMER COMPOSITIONS LUBRIZOL ADVANCED MAT INC (US) 2026-04-22 EP disclosed
EP-4724537-A1 COATING RESISTANT TO BIOGROWTH PARTICULARLY IN MARINE ENVIRONMENTS Core Industries II, LLC (US) 2026-04-15 EP disclosed
US-5485250-A Electrophotographic apparatus with photosensitive member having surface layer of binder resin and fluoro and/or silicon compound particles CANON KABUSHIKI KAISHA (JP) 1996-01-16 US disclosed
US-5480759-A ELECTROGRAPHY CANON KABUSHIKI KAISHA (JP) 1996-01-02 US disclosed
EP-0652489-A1 Process for processing a photosensitive lithographic printing plate requiring no fountain solution FUJI PHOTO FILM CO., LTD. (JP) 1995-05-10 EP disclosed
EP-0632337-A2 Image forming method CANON KABUSHIKI KAISHA (JP) 1995-01-04 EP disclosed
US-5357320-A Electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 1994-10-18 US disclosed
EP-0587067-A2 Electrophotographic apparatus CANON KABUSHIKI KAISHA (JP) 1994-03-16 EP disclosed