SCHEMBL17041925

SCHEMBL17041925

CC(C)N([SiH2][SiH2]N(C(C)C)C(C)C)C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18817985 0.84
SCHEMBL18817945 0.84
SCHEMBL18817987 0.81
SCHEMBL19101208 0.78
SCHEMBL19101256 0.78
SCHEMBL17295684 0.71
SCHEMBL17295686 0.71
SCHEMBL17041921 0.70
SCHEMBL16582936 0.68
SCHEMBL14802902 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4719364-A1 PREPARATION OF PHARMACEUTICAL COMPOSITIONS USING SUPERCYCLE VAPOR PHASE DEPOSITION OF INORGANIC OXIDES Applied Materials, Inc. (US) 2026-04-08 EP claimed
WO-2025096575-A1 METHODS FOR PREPARING DRUG CONTAINING PARTICLES ENCLOSED BY A LAMINATED ALUMINUM OXIDE AND SILICON OXIDE COATING APPLIED MATERIALS, INC. (US) 2025-05-08 WO claimed
WO-2025080671-A1 DOUBLE CONICAL ROTARY REACTOR INJECT APPLIED MATERIALS, INC. (US) 2025-04-17 WO claimed
EP-4518844-A1 OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS Applied Materials, Inc. (US) 2025-03-12 EP claimed
WO-2024249345-A1 PREPARATION OF PHARMACEUTICAL COMPOSITIONS USING SUPERCYCLE VAPOR PHASE DEPOSITION OF INORGANIC OXIDES APPLIED MATERIALS, INC. (US) 2024-12-05 WO claimed
CN-117942985-A Methane catalytic combustion catalyst with strong sulfur resistance, and preparation method and application thereof 中国科学院赣江创新研究院 2024-04-30 CN claimed
WO-2024006092-A1 METHOD FOR FORMATION OF CONFORMAL ALP SIO2 FILMS APPLIED MATERIALS, INC. (US) 2024-01-04 WO claimed
US-20230416909-A1 METHOD FOR FORMATION OF CONFORMAL ALD SIO2 FILMS APPLIED MATERIALS INC. 2023-12-28 US claimed
US-20230355536-A1 OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS APPLIED MATERIALS, INC. 2023-11-09 US claimed
WO-2023215472-A1 OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS APPLIED MATERIALS, INC. (US) 2023-11-09 WO claimed
CN-116782865-A Atomic layer deposition coated pharmaceutical packages, improved syringes and vials, e.g., for lyophilization/cold chain drugs/vaccines SIO2医药产品公司 2023-09-19 CN claimed
US-20230263957-A1 ATOMIC LAYER DEPOSITION COATED PHARMACEUTICAL PACKAGING AND IMPROVED SYRINGES AND VIALS, E.G. FOR LYOPHILIZED/COLD-CHAIN DRUGS/VACCINES OAKTREE FUND ADMINISTRATION, LLC 2023-08-24 US claimed
EP-4168068-A1 ATOMIC LAYER DEPOSITION COATED PHARMACEUTICAL PACKAGING AND IMPROVED SYRINGES AND VIALS, E.G. FOR LYOPHILIZED/COLD-CHAIN DRUGS/VACCINES SiO2 Medical Products, Inc. (US) 2023-04-26 EP claimed
US-20230114933-A1 GRAPHENE INTERCONNECT STRUCTURE, ELECTRONIC DEVICE INCLUDING GRAPHENE INTERCONNECT STRUCTURE, AND METHOD OF PREPARING GRAPHENE INTERCONNECT STRUCTURE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-04-13 US claimed
US-20230098270-A1 PRECURSORS FOR HIGH-TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS LAM RESEARCH CORPORATION 2023-03-30 US claimed
CN-115053016-A Precursors for high temperature deposition of silicon-containing films 朗姆研究公司 2022-09-13 CN claimed
US-20190006586-A1 CHALCOGENIDE FILMS FOR SELECTOR DEVICES ASM IP HOLDING B.V. (NL) 2019-01-03 US claimed
EP-2669249-B1 Method for depositing silicon-containing films using organoaminodisilane precursors VERSUM MAT US LLC (US) 2017-12-20 EP claimed
EP-4741655-A2 ATOMIC LAYER DEPOSITION COATED PHARMACEUTICAL PACKAGING AND IMPROVED SYRINGES AND VIALS, E.G. FOR LYOPHILIZED/COLD-CHAIN DRUGS/VACCINES SiO2 Medical Products, Inc. (US) 2026-05-13 EP disclosed
EP-2913334-A1 Organoaminosilanes and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-09-02 EP disclosed