⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22043072 | 0.94 | — | — | |
| SCHEMBL4498987 | 0.87 | TSHR (0.33) | — | |
| SCHEMBL23127823 | 0.79 | — | — | |
| SCHEMBL14781394 | 0.77 | — | — | |
| SCHEMBL7968694 | 0.77 | — | — | |
| SCHEMBL7582442 | 0.77 | — | — | |
| SCHEMBL1885347 | 0.77 | — | — | |
| SCHEMBL21180432 | 0.77 | — | — | |
| SCHEMBL1705404 | 0.77 | — | — | |
| SCHEMBL7968691 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3659999-B1 | METHOD FOR PRODUCING POLYTHIOL COMPOUND, METHOD FOR PRODUCING CURABLE COMPOSITION, AND METHOD FOR PRODUCING CURED MATERIAL | HOYA LENS THAILAND LTD (TH) | 2022-04-27 | — | — | EP | disclosed |
| EP-3257916-B1 | LIQUID CRYSTALLINE MEDIUM | MERCK PATENT GMBH (DE) | 2021-11-17 | — | — | EP | disclosed |
| EP-3660130-B1 | LIQUID CRYSTAL DISPLAYS AND LIQUID CRYSTALLINE MEDIA WITH HOMEOTROPIC ALIGNMENT | MERCK PATENT GMBH (DE) | 2021-08-04 | — | — | EP | disclosed |
| EP-3235894-B1 | LIQUID CRYSTALLINE MEDIUM | MERCK PATENT GMBH (DE) | 2020-12-23 | — | — | EP | disclosed |
| EP-3660130-A1 | LIQUID CRYSTAL DISPLAYS AND LIQUID CRYSTALLINE MEDIA WITH HOMEOTROPIC ALIGNMENT | Merck Patent GmbH (DE) | 2020-06-03 | — | — | EP | disclosed |
| EP-2271622-B1 | Heteroaryl derivatives as CFTR Modulators | VERTEX PHARMA (US) | 2017-10-04 | — | — | EP | disclosed |
| EP-2691490-B1 | LIQUID CRYSTALLINE MEDIUM | MERCK PATENT GMBH (DE) | 2017-07-26 | — | — | EP | disclosed |
| EP-2937401-B1 | LIQUID CRYSTALLINE MEDIUM | MERCK PATENT GMBH (DE) | 2017-04-05 | — | — | EP | disclosed |
| US-20160333277-A1 | METHOD FOR REMOVING SULFUR COMPOUNDS FROM HYDROCARBON STREAMS | BASF SE (DE) | 2016-11-17 | — | — | US | disclosed |
| EP-3092288-A1 | METHOD FOR REMOVING SULFUR COMPOUNDS FROM HYDROCARBON STREAMS | BASF SE (DE) | 2016-11-16 | — | — | EP | disclosed |
| US-20120136175-A1 | PROCESS FOR PREPARATION OF ALKYL SULFONE COMPOUNDS | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| EP-2441751-A1 | PROCESS FOR PREPARATION OF ALKYL SULFONE COMPOUNDS | Sumitomo Seika Chemicals CO. LTD. (JP) | 2012-04-18 | — | — | EP | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |