⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14955465 | 0.77 | — | — | |
| SCHEMBL12274522 | 0.77 | — | — | |
| SCHEMBL303281 | 0.75 | — | — | |
| SCHEMBL982269 | 0.73 | — | — | |
| SCHEMBL11499750 | 0.73 | — | — | |
| SCHEMBL5250874 | 0.73 | — | — | |
| SCHEMBL3345520 | 0.73 | — | — | |
| SCHEMBL7131928 | 0.71 | — | — | |
| SCHEMBL27739048 | 0.71 | — | — | |
| SCHEMBL1425619 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 609 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1353225-B1 | Radiation sensitive composition and compound | FUJIFILM CORP (JP) | 2014-06-04 | — | — | EP | claimed |
| US-8426101-B2 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | claimed |
| EP-1406122-B1 | PHOTOSENSITIVE COMPOSITION AND ACID GENERATOR | FUJIFILM CORP (JP) | 2013-01-09 | — | — | EP | claimed |
| US-8252508-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2012-08-28 | — | — | US | claimed |
| US-8241830-B2 | Positive resist composition and a pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-08-14 | — | — | US | claimed |
| US-7867697-B2 | Positive photosensitive composition and method of forming resist pattern | FUJIFILM CORPORATION (JP) | 2011-01-11 | — | — | US | claimed |
| US-20100261117-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2010-10-14 | — | — | US | claimed |
| US-7510822-B2 | Stimulation sensitive composition and compound | FUJIFILM CORPORATION (JP) | 2009-03-31 | — | — | US | claimed |
| US-7192685-B2 | Positive resist composition and method of forming resist pattern using the same. | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | claimed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | claimed |
| EP-1755000-A2 | Positive resist composition and a pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | claimed |
| US-7090960-B2 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-15 | — | — | US | claimed |
| US-7074544-B2 | Image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2006-07-11 | — | — | US | claimed |
| US-20050142484-A1 | Image recording material | FUJI PHOTO FILM CO., LTD. | 2005-06-30 | — | — | US | claimed |
| US-6830867-B2 | Acid generator capable of generating an acid by irradiation with actinic ray or radiation and having a structure represented by formula (I) defined in the specification and (B) a resin having a monocyclic or polycyclic alicyclic | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-14 | — | — | US | claimed |
| US-20030165776-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. | 2003-09-04 | — | — | US | claimed |
| US-11579528-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-02-14 | — | — | US | disclosed |
| US-11181820-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2021-11-23 | — | — | US | disclosed |
| EP-1300727-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-09 | — | — | EP | disclosed |
| US-6008267-A | CATIONIC POLYMERS HAVING ONIUM GROUPS AND A SULFONIMIDE ANION AS PHOTOINITIATORS FOR PHOTOPOLYMERIZATION; ADHESIVES; COATINGS; PHOTORESISTS | HYDRO-QUEBEC (CA) | 1999-12-28 | — | — | US | disclosed |