SCHEMBL17080376

SCHEMBL17080376

C=CCC[Cd]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23732 0.71
SCHEMBL8852489 0.71 TSHR (0.54)
SCHEMBL23116592 0.67
Hydrogen Sulfide SCHEMBL11571948 0.67 TSHR (0.50)
SCHEMBL31427576 0.67
Hydrogen Sulfide SCHEMBL21352279 0.67 TSHR (0.50)
SCHEMBL8523341 0.67
Phosphine SCHEMBL20503111 0.67
SCHEMBL22711591 0.67
SCHEMBL6055651 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3114174-B1 MULTILAYER STRUCTURE WITH GOOD UV AND SCRATCH PROTECTION COVESTRO DEUTSCHLAND AG (DE) 2017-11-29 EP disclosed
US-20170066890-A1 MULTI-LAYER STRUCTURE HAVING GOOD UV PROTECTION AND SCRATCH PROTECTION COVESTRO DEUTSCHLAND AG (DE) 2017-03-09 US disclosed
EP-3114174-A1 MULTI-LAYER STRUCTURE HAVING GOOD UV PROTECTION AND SCRATCH PROTECTION Covestro Deutschland AG (DE) 2017-01-11 EP disclosed
WO-2015132152-A1 MULTI-LAYER STRUCTURE HAVING GOOD UV PROTECTION AND SCRATCH PROTECTION BAYER MATERIALSCIENCE AG (DE) 2015-09-11 WO disclosed
CN-101910144-B P-hydroxy-phenyl acrylic acid derivative and application thereof MAO JINLONG 2014-04-23 CN disclosed