⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL797133 | 0.71 | — | — | |
| SCHEMBL2778497 | 0.71 | — | — | |
| SCHEMBL727520 | 0.67 | — | — | |
| SCHEMBL1647938 | 0.64 | — | — | |
| SCHEMBL101588 | 0.62 | — | — | |
| SCHEMBL234810 | 0.59 | — | — | |
| SCHEMBL7593675 | 0.59 | — | — | |
| Hydrochloric Acid SCHEMBL9459796 | 0.59 | — | — | |
| SCHEMBL4985639 | 0.59 | — | — | |
| SCHEMBL4304886 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220206404-A1 | HUMAN BODY-SAFE EXTERNAL ADDITIVE FOR TONER AND TONER MANUFACTURED USING SAME | Sukgyung AT Co., Ltd. (KR) | 2022-06-30 | — | — | US | disclosed |
| US-11181844-B2 | Toner and method of producing toner | CANON KABUSHIKI KAISHA (JP) | 2021-11-23 | — | — | US | disclosed |
| WO-2021029422-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-02-18 | — | — | WO | disclosed |
| US-20200379363-A1 | TONER AND METHOD OF PRODUCING TONER | CANON KABUSHIKI KAISHA (JP) | 2020-12-03 | — | — | US | disclosed |
| US-20200333707-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2020-10-22 | — | — | US | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| US-9809489-B2 | Composition for forming a conductive film, a conductive film, a method for producing a plating film, a plating film, and an electronic device | JSR CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20160081189-A1 | COMPOSITION FOR FORMING A CONDUCTIVE FILM, A CONDUCTIVE FILM, A METHOD FOR PRODUCING A PLATING FILM, A PLATING FILM, AND AN ELECTRONIC DEVICE | JSR CORPORATION (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
| CN-104049464-A | Grid insulation membrane, radiation sensitivity composition, hardened membrane, semiconductor element, manufacturing method of semiconductor element, and display device | JSR CORP | 2014-09-17 | — | — | CN | disclosed |
| CN-102156387-B | Radiation-sensitive composition and cured film | JSR CORP | 2014-01-15 | — | — | CN | disclosed |
| CN-102156387-A | Radiation-sensitive composition and cured film | JSR CORP | 2011-08-17 | — | — | CN | disclosed |