SCHEMBL1714746

SCHEMBL1714746

CC(C)(C)CON

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL1715803 0.96
SCHEMBL10270624 0.77
SCHEMBL15988732 0.74
SCHEMBL1002782 0.72
SCHEMBL21526273 0.72
SCHEMBL9186799 0.72
Hydrochloric Acid SCHEMBL7232875 0.72
SCHEMBL15918608 0.72
SCHEMBL28214453 0.72
Hydrochloric Acid SCHEMBL4771424 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 369 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103626930-B A kind of preparation method of Aqueous acrylic urethane's matting resin with phase separation structure 中科院广州化学有限公司 2016-08-24 CN claimed
CN-103613702-B A kind of water-soluble multifunctional acrylic matting resin and preparation method thereof 中科院广州化学有限公司 2016-08-17 CN claimed
CN-103360537-B A kind of nano silicon dispersion agent and its preparation method and application GUANGZHOU CHEMISTRY CO., LTD. CHINESE ACADEMY OF SCIENCES (CN) 2015-11-18 CN claimed
CN-103602134-B A kind of β-crotonic acid analog copolymer dispersion agent and its preparation method and application GUANGZHOU INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2015-08-05 CN claimed
CN-103113701-B Water-soluble anionic acrylic resin composition for extinction and preparation method thereof CAS GUANGZHOU CHEMISTRY CO LTD 2015-05-13 CN claimed
CN-103764302-A Treatment of plastic surfaces after etching in nitric acid containing media MACDERMID ACUMEN INC 2014-04-30 CN claimed
CN-103626930-A Preparation method of water-based acrylic acid polyurethane extinction resin with phase separation structure CAS GUANGZHOU CHEMISTRY CO LTD 2014-03-12 CN claimed
CN-103613702-A Aqueous multi-functional crylic acid extinction resin and preparation method thereof CAS GUANGZHOU CHEMISTRY CO LTD 2014-03-05 CN claimed
CN-103602134-A Dispersing agent of crotonic copolymers as well as preparation method and application thereof GUANGZHOU INST OF CHEMISTRY 2014-02-26 CN claimed
CN-102337073-B Water-soluble nonluminous anionic electrophoretic coating and preparation method and application thereof CAS GUANGZHOU CHEMISTRY CO LTD 2013-12-25 CN claimed
CN-103360537-A Nano-silica dioxide dispersant, preparation method and application of nano-silica dioxide dispersant CAS GUANGZHOU CHEMISTRY CO LTD 2013-10-23 CN claimed
CN-103113701-A Water-soluble anionic acrylic resin composition for extinction and preparation method thereof CAS GUANGZHOU CHEMISTRY CO LTD 2013-05-22 CN claimed
CN-102115526-B Extinction acrylic resin for anodic electrophoresis and preparation method thereof CAS GUANGZHOU CHEMISTRY CO LTD 2012-11-28 CN claimed
CN-102337073-A Water-soluble nonluminous anionic electrophoretic coating and preparation method and application thereof GUANGZHOU CHEMISTRY CO LTD CAS 2012-02-01 CN claimed
CN-102115526-A Extinction acrylic resin for anodic electrophoresis and preparation method thereof GUANGZHOU CHEMISTRY CO LTD CAS 2011-07-06 CN claimed
US-20070244117-A1 Novel Hydroxamic Acid Esters and Pharmaceutical Use Thereof LEO PHARMA A/S (DK) 2007-10-18 US claimed
CN-1906155-A Novel hydroxamic acid esters and pharmaceutical use thereof LEO PHARMA AS (DK) 2007-01-31 CN claimed
CN-1662581-A Amino-functional polysiloxanes and their use in coatings SIGMAKALON SERVICES B V (NL) 2005-08-31 CN claimed
EP-4658667-A1 CYCLIC PEPTIDES FOR INHIBITING TNF RECEPTOR 1 ACTIVITY Merck Sharp & Dohme LLC (US) 2025-12-10 EP disclosed
CN-1040605-A The urethane resin that is used for aqueous filler composition HOECHST AG (DE) 1990-03-21 CN disclosed