Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | HBB | P68871 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.52 |
| ▸ | DHFR | P00374 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | USP2 | O75604 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21119007 | 0.89 | TP53 (0.64) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL21119006 | 0.89 | TP53 (0.64) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL25572332 | 0.85 | SMN1; SMN2 (0.39) | TP53HBBSMN1; SMN2MEN1KMT2A | |
| SCHEMBL6454276 | 0.82 | TP53 (0.56) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL25999178 | 0.80 | TP53 (0.45) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL15081911 | 0.79 | MEN1 (0.42) | TP53HBBSMN1; SMN2MEN1KMT2A | |
| SCHEMBL13867767 | 0.78 | TP53 (0.52) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL133910 | 0.78 | TP53 (0.47) | TP53HBBSMN1; SMN2DHFRMEN1 | |
| SCHEMBL14598531 | 0.77 | TP53 (0.42) | TP53HBBSMN1; SMN2DHFR | |
| SCHEMBL964091 | 0.77 | SMN1; SMN2 (0.56) | TP53HBBSMN1; SMN2DHFRMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | claimed |
| US-7790356-B2 | Condensation type polymer-containing anti-reflective coating for semiconductor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-09-07 | — | — | US | claimed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | claimed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | claimed |
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-11768436-B2 | Protective film forming composition having a diol structure | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| US-11768436-B2 | Protective film forming composition having a diol structure | NISSAN CHEMICAL CORPORATION (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-101160549-A | Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography | NISSAN CHEMICAL IND LTD (JP) | 2008-04-09 | — | — | CN | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-4459392-A | Method of making and polymer of heat resistant polyester using diglycidilhydantoins, diglycidiluracils, diglycidilbarbituric and isocyanuric acids | UNITIKA LIMITED (JP) | 1984-07-10 | — | — | US | disclosed |
| US-4117029-A | VINYL CHLORIDE POLYE | NITTO KASEI CO. LTD. (JP) | 1978-09-26 | — | — | US | disclosed |