⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6689580 | 0.96 | — | — | |
| SCHEMBL3624815 | 0.93 | POLB (0.31) | — | |
| SCHEMBL1169757 | 0.89 | — | — | |
| SCHEMBL1720520 | 0.89 | POLB (0.32) | — | |
| SCHEMBL3309020 | 0.89 | TSHR (0.33) | — | |
| SCHEMBL8909769 | 0.86 | GAA (0.31) | — | |
| SCHEMBL16161480 | 0.86 | GAA (0.31) | — | |
| SCHEMBL19293544 | 0.86 | GAA (0.31) | — | |
| SCHEMBL2113593 | 0.86 | GAA (0.31) | — | |
| SCHEMBL10796699 | 0.86 | GAA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-3968126-A | Ferrocene derivatives and their preparation | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1976-07-06 | — | — | US | claimed |
| CN-109734747-B | Chiral iminodiphosphate and derivatives thereof | 科勒研究有限公司 | 2024-08-27 | — | — | CN | disclosed |
| EP-4413012-A1 | PROCESS FOR C-H INSERTION BY GEM-HYDROGENATION OF AN INTERNAL ALKYNE | Studiengesellschaft Kohle gGmbH (DE) | 2024-08-14 | — | — | EP | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| EP-3632907-B1 | N-(AZAARYL)CYCLOLACTAM-1-CARBOXAMIDE DERIVATIVE, PREPARATION METHOD THEREFOR, AND USE THEREOF | ABBISKO THERAPEUTICS CO LTD (CN) | 2024-02-28 | — | — | EP | disclosed |
| EP-3663285-B1 | FORMYLPYRIDINE DERIVATIVE HAVING FGFR4 INHIBITORY ACTIVITY, PREPARATION METHOD THEREFOR AND USE THEREOF | ABBISKO THERAPEUTICS CO LTD (CN) | 2024-01-24 | — | — | EP | disclosed |
| EP-3632906-B1 | AZAARYL DERIVATIVE, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF FOR USE IN PHARMACY | ABBISKO THERAPEUTICS CO LTD (CN) | 2023-12-13 | — | — | EP | disclosed |
| EP-4265610-A1 | MACROCYCLIC K-RAS G12C INHIBITOR, PREPARATION METHOD THEREFOR AND USE THEREOF | Abbisko Therapeutics Co., Ltd. (CN) | 2023-10-25 | — | — | EP | disclosed |
| EP-4257584-A1 | 2,3-DIHYDRO-1H-PYRROLO[3,2-B]PYRIDINE DERIVATIVE, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF | Abbisko Therapeutics Co., Ltd. (CN) | 2023-10-11 | — | — | EP | disclosed |
| WO-2007132496-A1 | DIOXASPIROKETAL DERIVATIVES, PROCESS FOR THEIR PREPARATION AND USES THEREOF | CONSIGLIO NAZIONALE DELLE RICERCHE (IT) | 2007-11-22 | — | — | WO | disclosed |
| CN-100341992-C | Composition and method for removing residues from semiconductor manufacturing | EKC TECHNOLOGY INC (US) | 2007-10-10 | — | — | CN | disclosed |
| US-20060165636-A1 | Hair treatment composition and hair cosmetic for damaged hair | MEIJI SEIKA KAISHA, LTD. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20060018867-A1 | Cosmetic composition and production thereof | ICHIMARU PHARCOS CO., LTD | 2006-01-26 | — | — | US | disclosed |
| CN-1721516-A | Semiconductor process residue removal composition | EKC TECHNOLOGY INC (US) | 2006-01-18 | — | — | CN | disclosed |
| EP-1604647-A1 | Cosmetic composition containing polyorganosiloxane-containing epsilon-polylysine polymer, and polyhydric alcohol, and production thereof | Ichimaru Pharcos Co., Ltd. (JP) | 2005-12-14 | — | — | EP | disclosed |
| EP-1602354-A1 | HAIR TREATMENT COMPOSITION AND HAIR COSMETIC FOR DAMAGED HAIR | Meiji Seika Kaisha, Ltd. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-6866792-B2 | Compositions for chemical mechanical planarization of copper | EKC TECHNOLOGY, INC. (US) | 2005-03-15 | — | — | US | disclosed |
| CN-1465687-A | Composition and method for removing residues from semiconductor manufacturing | EKC������˾ | 2004-01-07 | — | — | CN | disclosed |
| EP-0431605-A2 | 1-Azabicyclo[m.n.O]alkane derivatives, their salts and process for preparing them | SANWA KAGAKU KENKYUSHO CO., LTD. (JP) | 1991-06-12 | — | — | EP | disclosed |