SCHEMBL17289488

SCHEMBL17289488

C[Si](C)(C)O[Si](C)(CCC(O)CC1CO1)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22833249 0.86
SCHEMBL3064066 0.84
SCHEMBL7110747 0.82
SCHEMBL1803846 0.81
SCHEMBL515903 0.77
SCHEMBL980580 0.77
SCHEMBL28024029 0.77
SCHEMBL28047669 0.75
SCHEMBL21925307 0.75
SCHEMBL818030 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10483011-B2 Conductive composition, conductive composition production method, anti-static resin composition and antistatic resin film SHIN-ETSU POLYMER CO., LTD. (JP) 2019-11-19 US disclosed
EP-2957597-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COMPOSITION PRODUCTION METHOD, ANTI-STATIC RESIN COMPOSITION AND ANTISTATIC RESIN FILM Shin-Etsu Polymer Co. Ltd. (JP) 2015-12-23 EP disclosed
US-20150348670-A1 CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed
US-20150348671-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COMPOSITION PRODUCTION METHOD, ANTI-STATIC RESIN COMPOSITION AND ANTISTATIC RESIN FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed