Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | APEX1 | P27695 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17297649 | 0.85 | TSHR (0.40) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL17300343 | 0.81 | TSHR (0.48) | TSHRTHRBALDH1A1 | |
| SCHEMBL15280981 | 0.79 | TSHR (0.36) | TSHRTHRBALDH1A1 | |
| SCHEMBL18031807 | 0.78 | TSHR (0.48) | TSHRTHRBALDH1A1POLBHTT | |
| SCHEMBL10095103 | 0.77 | TSHR (0.38) | TSHRTHRB | |
| SCHEMBL15234625 | 0.76 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL17779893 | 0.76 | TSHR (0.33) | TSHRTHRBALDH1A1 | |
| SCHEMBL17775480 | 0.76 | TSHR (0.37) | TSHR | |
| SCHEMBL8850932 | 0.75 | TSHR (0.57) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL17302791 | 0.75 | TSHR (0.46) | TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2950143-B1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-07-20 | — | — | EP | disclosed |
| US-20150346600-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-03 | — | — | US | disclosed |
| EP-2950143-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-02 | — | — | EP | disclosed |